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AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model
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- Journal:
- MRS Advances / Volume 4 / Issue 27 / 2019
- Published online by Cambridge University Press:
- 31 January 2019, pp. 1579-1587
- Print publication:
- 2019
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- Article
- Export citation