Laser induced fluorescence of CF2 has been observed in plasmas of CF4 and its mixtures with O2 and H2. Surface removal rates of the radical in pure CF4 were measured by observing the decay of the radical when the plasma is switched off. The reduction in CF2 concentration, and the increase in F atom concentrations (the latter measured by optical emission spectroscopy) on the addition of O2 is reproduced by a model of the plasma in which gas phase chemical reactions play a dominant role. The increase in CF2 concentration on the addition of H2 to a CF4 plasma is shown to be due to a reduction in the surface removal rate.