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Precise Characterization of Resists and Thin Gate Dielectrics in the VUV Range for 157nm Lithography
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- Journal:
- MRS Online Proceedings Library Archive / Volume 636 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D9.2.1
- Print publication:
- 2000
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Precise characterization of ultrathin nitride/oxide gate dielectrics by grazing x-ray reflectance and spectroscopic ellipsometry
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- Journal:
- MRS Online Proceedings Library Archive / Volume 592 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 63
- Print publication:
- 1999
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A New Purged UV Spectroscopic Ellipsometer to characterize 157nm nanolithographic materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 584 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 177
- Print publication:
- 1999
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