3 results
Strain-Transfer Structure Beneath the Transistor Channel for Increasing the Strain Effects of Lattice-Mismatched Source and Drain Stressors
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 995 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0995-G01-03
- Print publication:
- 2007
-
- Article
- Export citation
Material and Electrical Characterization of Nickel Silicide-Carbon as Contact Metal to Silicon-Carbon Source and Drain Stressors
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 995 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0995-G05-07
- Print publication:
- 2007
-
- Article
- Export citation
Process-Induced Strained P-MOSFET Featuring Nickel-Platinum Silicided Source/Drain
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 913 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0913-D02-04
- Print publication:
- 2006
-
- Article
- Export citation