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A Less Damaging Patterning Regime for a Successful Integration of Ultra Low-k Materials in Modern Nanoelectronic Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1335 / 2011
- Published online by Cambridge University Press:
- 03 August 2011, mrss11-1335-o04-02
- Print publication:
- 2011
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- Article
- Export citation