1 results
Si Surface Orientation Dependence on the Electrical Characteristics of HfN Gate Insulator with sub-0.5 nm EOT Formed by ECR Plasma Sputtering
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1588 / 2014
- Published online by Cambridge University Press:
- 20 February 2014, jsapmrs13-1588-6607
- Print publication:
- 2014
-
- Article
- Export citation