We fabricated the double epitaxial layers of Ir on barrier metal ZrN for Pb(ZrxTi1−x)O3 (PZT), using reactive sputtering. In order to remove the surface oxide layer of the ZrN film prior to depositing the Ir film, we used a new treatment method, in which the ZrN film is dipped into a 0.5% buffered HF solution for less than 30 seconds and then immediately dipped into a hydrazine (N2H4) monohydrate solution for 60 seconds. Also, in order to suppress the generation of twin boundaries and to improve crystalline quality, the ZrN film is deposited using a two-step method, which consists of an initial high temperature deposition step at 850s°C followed by a lower temperature step at 600°C. On the ZrN film prepared by these methods, we can obtain a mainly (110)-oriented epitaxial Ir film.