2 results
Characterization of Atomic Layer Deposited Ultrathin HfO2 Film as a Diffusion Barrier in Cu Metallization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 990 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0990-B09-03
- Print publication:
- 2007
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- Article
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Evaluation and Testing of Organometallic Precursor for Copper Direct-Write
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1002 / 2007
- Published online by Cambridge University Press:
- 17 March 2011, 1002-N07-23
- Print publication:
- 2007
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- Article
- Export citation