In this work, phosphor imaging plate technology is applied to measure electron scattering directly in the environmental scanning electron microscope (ESEM) specimen chamber. The scattering of electrons from the primary electron beam, under relatively high-pressure conditions (266 Pa) in the ESEM sample chamber, degrades the analytical accuracy of elemental analysis. The degree of this degradation is poorly known. To date, attempts to measure experimentally the spatial distribution of the scattered electrons have been limited to observing secondary effects such as the intensity of x-rays produced from copper targets positioned at various distances from the primary electron beam interaction point. A more accurate distribution of the scattered electron intensity can be obtained from a direct measurement of both the scattered and unscattered electrons over a large area with single electron sensitivity. Improvements to the accuracy of Monte Carlo models of the scattering process will be made possible by the direct measurement data.