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Nanopatterning and Nanomachining with Table-top Extreme Ultraviolet Lasers

Published online by Cambridge University Press:  01 February 2011

Mario Marconi ,
Przemyslaw Wojciech Wachulak ,
Maria Gabriela Capeluto ,
Georgyi Vaschenko ,
Herman Bravo ,
Carmen S Menoni ,
Jorge Rocca ,
Erik H Anderson ,
Weilun Chao  and
David Attwood
...Show all authors
Mario Marconi
Affiliation:
marconi@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States, 970-491-8299, 970-4918671
Przemyslaw Wojciech Wachulak
Affiliation:
wachulak@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Maria Gabriela Capeluto
Affiliation:
maga@df.uba.ar, Universidad de Buenos Aires, Departamento de Fisica, Facultad de Ciencias Exactas, Ciudad Universitaria-Pabellon 1, Buenos Aires, C1428EHA, Argentina
Georgyi Vaschenko
Affiliation:
vaschenko@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Herman Bravo
Affiliation:
hbravo@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Carmen S Menoni
Affiliation:
carmen@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Jorge Rocca
Affiliation:
rocca@engr.colostate.edu, Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Erik H Anderson
Affiliation:
ehanderson@lbl.gov, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
Weilun Chao
Affiliation:
ehanderson@lbl.gov, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
David Attwood
Affiliation:
attwood@berkeley.edu, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
Oscar Hemberg
Affiliation:
ohemberg@jmar.com, JMAR Technologies Inc., San Diego, CA, 92127, United States
Bradley Frazer
Affiliation:
bfrazer@jmar.com, JMAR Technologies Inc., San Diego, CA, 92127, United States
Scott Bloom
Affiliation:
sbloom@jmar.com, JMAR Technologies Inc., San Diego, CA, 92127, United States
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Abstract

Nanopatterning and nanomachining of PMMA coated wafers was performed using table top extreme ultraviolet lasers. Features below 100 nm were imprinted with short (50-60 s) exposure times.

Keywords

nanoscalelaser ablationlithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O06-05
Copyright
Copyright © Materials Research Society 2007

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References

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