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Thermal Ranges and Figures of Merit for Gold-Containing Precursors For ALD

13 October 2020, Version 1
Working Paper
This content is an early or alternative research output and has not been peer-reviewed by Cambridge University Press at the time of posting.

Abstract

A survey of known gold-containing chemical vapour deposition (CVD) and atomic layer deposition (ALD) precursors, with a focus on collecting their volatilization and decomposition data. These data were applied to a figure of merit (σ) developed to easily assess the thermal characteristics.

Keywords

atomic layer deposition
gold
precursor
thermal characteristics

Supplementary materials

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Title
gold review-supp final
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Now Published

Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition [opens in a new tab]
Matthew B. E. Griffiths, Zachary S. Dubrawski, Peter G. Gordon, Marcel Junige, Seán T. Barry journal article
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 39, Issue 2
Online publication date: Jan 27, 2021

Version History

Oct 13, 2020 Version 1

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The content is available under CC BY NC ND 4.0 [opens in a new tab]

DOI

10.26434/chemrxiv.13077386.v1
D O I: 10.26434/chemrxiv.13077386.v1 [opens in a new tab]

Funding

NSERC Discovery Grant

Author’s competing interest statement

None

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