Partial Dewetting and Labyrinthine Pattern Formation on Polystyrene Films Immersed in Ternary Solvent Mixtures

10 December 2025, Version 1
This content is an early or alternative research output and has not been peer-reviewed by Cambridge University Press at the time of posting.

Abstract

This research examines partial dewetting and labyrinthine morphologies in thin polystyrene (PS) films using a ternary solvent mixture of water, acetone, and methyl ethyl ketone (MEK) (15:3:7 by volume). The films are initially glassy but destabilize due to the solvent into mixed structures containing labyrinth-like patterns and holes, not droplets. Morphological changes result from solvent–nonsolvent interactions. MEK is a good solvent that swells the film, lowers the glass transition temperature, and increases chain mobility, while acetone, as a cosolvent, provides uniform solvent uptake, and water as a nonsolvent reduces film–substrate affinity and promotes spreading-driven dewetting. The opposing influence of these factors leads to viscosity gradients that drive heterogeneous nucleation of holes, their growth to large size, and partial coalescence. The process ends before equilibrium is reached as rapid evaporation of MEK balances driving forces with viscosity, and traps intermediate structures. The physics behind the existence or a mechanical pathway to intermediate structures is provided by studies of the spreading coefficient and hole growth. This work demonstrates engineering solvent mixtures for controlled non-equilibrium surface patterning in polymer thin films.

Keywords

Partial dewetting
Labyrinthine morphology
Thin films
Ternary solvent mixtures
Non-equilibrium patterns
Solvent–nonsolvent interaction

Comments

Comments are not moderated before they are posted, but they can be removed by the site moderators if they are found to be in contravention of our Commenting and Discussion Policy [opens in a new tab] - please read this policy before you post. Comments should be used for scholarly discussion of the content in question. You can find more information about how to use the commenting feature here [opens in a new tab] .
This site is protected by reCAPTCHA and the Google Privacy Policy [opens in a new tab] and Terms of Service [opens in a new tab] apply.