Symposium K – Materials Modification by Energetic Atoms and Ions
Research Article
Atomic and Molecular Beam Studies of Etching and Related Surface Chemistries
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- 25 February 2011, 3
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Mass Spectrometric Study of ECR Microwave Plasma Etching of Si3N4 Films
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- 25 February 2011, 11
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HI/H2 ECR Plasma Etching of III-V Semiconductors
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- 25 February 2011, 17
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The Role of Ion Beam Assisted Surface Chemistry in Etching: Adsorption and Reactions of ALKYL Halides
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- 25 February 2011, 23
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A Photoluminescence Investigation of Ion Beam and Electron Cyclotron Resonance ETCH-Induced Damage on GaAs/AlGaAs Multi Quantum Well Structures
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- 25 February 2011, 29
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Ultra-Low Damage Chemical Etching of GaAs with a Novel Ion Beam Source
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- 25 February 2011, 35
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Oxide Degradation Effects in Dry Patterning of Resist Using Neutral Oxygen Beams
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- 25 February 2011, 41
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Detailed Model of the Afterglow Region of a Microwave Generated Oxygen Plasma
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- 25 February 2011, 49
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New Approaches for Dry Etching Metal Oxides at low Temperature and High Rates
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- 25 February 2011, 57
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Removal of Surface Carbon Impurities from Ultra-Low Loss Fluoride Glasses
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- 25 February 2011, 63
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Formation of Defects During Ion-Assisted Growth of Thin Films from the Vapor Phase
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- 25 February 2011, 71
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Reactive Magnetron Sputtering: In Situ Analyses of Particle Fluxes and Interactions with the Growth Surface
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- 25 February 2011, 83
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Role of Kinetic Energy of Sputtered Particles in Thin Film Properties
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- 25 February 2011, 95
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Computer Simulation of Scattered Ion and Sputtered Species Effects in Ion Beam Sputter-Deposition of High Temperature Superconducting Thin Films
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- 25 February 2011, 107
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Molecular Dynamics Simulations of Low-Energy Atom-Surface Interactions
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- 25 February 2011, 115
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Suppression of Island Formation During Initial Stages of Ge/Si(100) Growth by Ion-Assisted Molecular Beam Epitaxy
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- 25 February 2011, 127
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Some Properties of a-SixC1−xH Films Prepared by a Mixed Frequency PECVD Process
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- 25 February 2011, 133
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Influence of Plasma Density and Energy on the Characteristics of Amorphous Silicon Films Prepared by ECR Microwave Plasma CVD
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- 25 February 2011, 139
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Fabrication of P-Type Cuinse2 Thin Film by MBD Using ECR Excited Nitrogen Ion Source
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- 25 February 2011, 145
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Defect Structure of SiON Films Prepared by ECR Plasma CVD Method
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- 25 February 2011, 151
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