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Improvement of oxidation resistance of Si3N4 by heat treatment in a wet H2 atmosphere

Published online by Cambridge University Press:  31 January 2011

Young-Hag Koh ,
Hae-Won Kim  and
Hyoun-Ee Kim
Young-Hag Koh
Affiliation:
School of Materials Science and Engineering, Seoul National University, Seoul, 151–742, Korea
Hae-Won Kim
Affiliation:
School of Materials Science and Engineering, Seoul National University, Seoul, 151–742, Korea
Hyoun-Ee Kim
Affiliation:
School of Materials Science and Engineering, Seoul National University, Seoul, 151–742, Korea
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Abstract

To improve the oxidation resistance of Si3N4 material, a dense and continuous layer, composed of small Y2Si2O7 crystallites and silicate glass, was formed on the surface. The surface layer was formed by exposing the specimens in a flowing H2 atmosphere containing 0.1% H2O at 1450 °C for 1 h. For the purpose of comparison, specimens of the same material were heat treated in air at 1450 °C for 1 h. Small equiaxed Y2Si2O7 crystallites were formed when the specimen was heat treated in the wet H2 atmosphere, while relatively large and elongated Y2Si2O7 crystallites developed when the specimens were heat treated in air. The oxidation resistance of Si3N4 material was improved remarkably by the heat treatment in the wet H2, while no improvement in oxidation resistance was observed from the specimen heat treated in air. The improvement was attributed to the retardation of the transport of oxidants through the dense and continuous layer formed on the surface.

Type
Articles
Information
Journal of Materials Research , Volume 17 , Issue 9 , September 2002 , pp. 2321 - 2326
Copyright
Copyright © Materials Research Society 2002

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