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In situ mass spectrometry during diamond chemical vapor deposition using a low pressure flat flame

Published online by Cambridge University Press:  31 January 2011

C. A. Wolden ,
R. F. Davis ,
Z. Sitar  and
J. T. Prater
C. A. Wolden
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695–7919
R. F. Davis
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695–7919
Z. Sitar
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695–7919
J. T. Prater
Affiliation:
Army Research Office, Research Triangle Park, North Carolina 27709–2211
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Abstract

A combination of experiments and detailed kinetic modeling was used to investigate diamond deposition chemistry in low pressure combustion synthesis. Microprobe sampling was employed to provide in situ, quantitative measurements of the stable gas-phase species impinging the growth surface. The reactant gas ratio was found to be the most critical experimental variable. A detailed kinetic model was developed for the stagnation flow system. Comparison of experimental measurements showed very good agreement with model predictions. The model was then used to predict the concentration of radical species and analyze the sensitivity of predictions to γH, the probability of atomic hydrogen recombination on the surface. It was shown that γH dramatically affects the distribution of radical species near the diamond surface. The analysis also indicates that atomic carbon may be an important gas-phase precursor in this system. Comparison of mole fraction measurements and observations of film morphology were used to draw conclusions on the growth mechanism.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 10 , October 1997 , pp. 2733 - 2742
Copyright
Copyright © Materials Research Society 1997

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