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Microstructure and orientation of iron crystals by thermal chemical vapor deposition with imposition of magnetic field

Published online by Cambridge University Press:  31 January 2011

Noboru Yoshikawa
Affiliation:
Department of Metallurgy, Graduate School of Engineering, Tohoku University, 02 Aza-Aoba, Aramaki, Aoba-ku, Sendai, Japan, 980–8579
Takanori Endo
Affiliation:
Department of Metallurgy, Graduate School of Engineering, Tohoku University, 02 Aza-Aoba, Aramaki, Aoba-ku, Sendai, Japan, 980–8579
Shoji Taniguchi
Affiliation:
Department of Metallurgy, Graduate School of Engineering, Tohoku University, 02 Aza-Aoba, Aramaki, Aoba-ku, Sendai, Japan, 980–8579
Satoshi Awaji
Affiliation:
Institute for Materials Research, Tohoku University, 2–1-1 Katahira, Aoba-ku, Sendai, Japan, 980–8577
Kazuo Watanabe
Affiliation:
Institute for Materials Research, Tohoku University, 2–1-1 Katahira, Aoba-ku, Sendai, Japan, 980–8577
Eiji Aoyagi
Affiliation:
Institute for Materials Research, Tohoku University, 2–1-1 Katahira, Aoba-ku, Sendai, Japan, 980–8577
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Abstract

Iron crystals were deposited by thermally activated chemical vapor deposition with imposition of magnetic field. In this study, the deposition was conducted by imposing a magnetic field up to 3.5 T in a temperature range between 0.48 and 0.51 of TmFe (melting point of iron), which is below the Curie point of iron (0.58 TmFe). The microstructures and crystal orientations of the deposits were investigated. In the deposition process, island-shaped crystals were formed on a scale of several microns; then a film was grown by their coalescence. As the magnetic field magnitude increased, population of the island-shaped crystals having a cubic shape increased. Simultaneously, their ω-scanned (200) profile became sharper. Their degree of (100) preferred orientation was dependent on the magnetic field up to 3.5 T, which is usually high enough for the saturated magnetization of iron crystals. However, when the substrate was placed parallel to the magnetic field, (100) preferred orientation was not observed for the island-shaped crystals. A large and bimodal ω-scanned (110) profile having sharp peaks was obtained when the substrate was inclined 45° to the field. Preferred (100) orientation was not obtained from the iron films, for which two reasons were pointed out. The first is the secondary grown crystals on the island-shaped crystals having different orientations, and the second is the observed zone III grain structure of the films, where grain boundary migration occurred.

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Articles
Copyright
Copyright © Materials Research Society 2002

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References

REFERENCES

1.Gillon, P., Mater. Sci. Eng. A287, 146 (2000).CrossRefGoogle Scholar
2.Motokawa, M., Mater. Jpn. 37, 26 (1998, in Japanese).CrossRefGoogle Scholar
3.Mee, C.D. and Daniel, E.D., Magnetic Recording Handbook (McGraw-Hill, New York, 1989), p. 215.Google Scholar
4.Devos, O., Olivier, A., Chopart, J.P., Aaboubi, O., and Maurin, G., J. Electrochem. Soc. 145, 401 (1998).CrossRefGoogle Scholar
5.Taniguchi, T., Sassa, K., Yamada, T., and Asai, S., Mater. Trans., JIM 41, 981 (2000).CrossRefGoogle Scholar
6.Mitani, S., Bai, H.L., Wang, Z.J., Fujimori, H., and Motokawa, M., Proc. 3rd Int. Symp. of Electromagnetic Processing of Materials (EPM), edited by Aso, S. (ISIJ, Tokyo, Japan 2000), pp. 630–634.Google Scholar
7.Bai, H.L., Mitani, S., Wang, Z.J., Fujimori, H., and Motokawa, M., Thin Solid Films 389, 51 (2001).CrossRefGoogle Scholar
8.Tahashi, M., Sassa, K., Hirabayashi, I., and Asai, S., Mater. Trans., JIM 41, 985 (2000).CrossRefGoogle Scholar
9.Ma, Y., Watanabe, K., Awaji, S., and Motokawa, M., Appl. Phys. Lett. 77, 3633 (2000).CrossRefGoogle Scholar
10.Thorton, J.A., Thin Solid Films 40, 335 (1977).CrossRefGoogle Scholar
11.Parson, R., in Thin Film Processes II, edited by Vossen, J.L. and Kern, W. (Academic Press, London, U.K., 1991), p. 181.Google Scholar
12.Yoshikawa, N. and Kikuchi, A., J. Mater. Res. 10, 2801 (1995).CrossRefGoogle Scholar
13.Movchan, B.A. and Demchishin, A.V., Fiz. Metal. Metalloved 28, 653 (1969).Google Scholar
14.Bryant, W.A., J. Mater. Sci. 12, 1285 (1977).CrossRefGoogle Scholar
15.Martikainen, H.O. and Lindroos, V.K., Scand. J. Met. 10, 3 (1981).Google Scholar
16.Cline, J.E. and Wulff, J., J. Electrochem. Soc. 98, 385 (1961).CrossRefGoogle Scholar
17.Vaudin, M., Proc. ICOTOM12, edited by Szpunar, J.A. (NRC Research Press, Ottawa, 1999), p. 186.Google Scholar
18.Whitfield, M.D., Savage, J.A., and Jackman, R.B., Diamond Relat. Mater. 9, 262 (2000).CrossRefGoogle Scholar
19. M. Vaudin (private communication).Google Scholar
20.Honda, K. and Kaya, S., Sci. Rep. Tohoku Univ. 15, 736 (1926).Google Scholar
21.Wakiyama, T., in Physics and Engineering Applications of Magnetism, Springer Series in Solid-State Science, edited by Ishikawa, Y. and Muira, N. (Springer-Verlag Berlin, Heidelberg, Germany, 1991), p. 139.Google Scholar
22.Mutaftschiev, B. in Handbook of Crystal Growth, edited by Hurle, D.T.J. (Elsevier, Amsterdam, The Netherlands, 1993), p. 213.Google Scholar
23.Warren, B.E., X-ray Diffraction (Addison-Wesley, Reading, MA, 1969), p. 366.Google Scholar
24.Swalin, R.A., Thermodynamics of Solids (John Wiley and Sons, New York, 1963); translated in Japanese (Corona Inc., Tokyo, 1965), p. 205.Google Scholar
25.Chadwick, G.A. and Smith, D.A., Grain Boundary Structure and Properties (Academic Press, New York, 1976), p. 150.Google Scholar