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Structure-property-performance of nanocomposite Cr–Si–N films synthesized by a duplex surface treatment technique

Published online by Cambridge University Press:  24 November 2011

Daohui Lai
Affiliation:
Department of Material Science and Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, People’s Republic of China
Jiang Xu*
Affiliation:
Department of Material Science and Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, People’s Republic of China; and School of Engineering, Edith Cowan University, Joondalup, Western Australia 6027, Australia
Zong-Han Xie
Affiliation:
School of Engineering, Edith Cowan University, Joondalup, Western Australia 6027, Australia
Paul R. Munroe
Affiliation:
School of Materials Science and Engineering, University of New South Wales, New South Wales 2052, Australia
*
a)Address all correspondence to this author. e-mail: xujiang73@nuaa.edu.cn
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Abstract

Nanocomposite Cr–Si–N films were prepared on to Ti–6Al–4V substrates by a novel duplex surface treatment technique. Coatings consisting of a Cr3Si surface layer were deposited using a double cathode glow plasma and subsequent surface plasma nitriding. The surface topography, chemical composition, and microstructure of these treated alloys were analyzed by a variety of surface characterization techniques. The resulting Cr–Si–N films consisted of nanocrystallite CrN grains embedded in amorphous SiNx phase. Nanoindentation tests showed that with increasing nitrogen partial pressure the hardness of the Cr–Si–N films increased and the elastic modulus decreased. Wear experiments showed that the Cr–Si–N films produced at a nitrogen partial pressure of 4.5Pa and 800 °C possessed the lowest wear rate and friction coefficient. Moreover, electrochemical measurements in 5 wt% HCl solution indicated that the Cr–Si–N films acted as an effective barrier against acid attack on the alloys.

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Articles
Copyright
Copyright © Materials Research Society 2011

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