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Role of static inductance on ion beam emission in plasma focus devices

Published online by Cambridge University Press:  01 May 2012

FARZIN M. AGHAMIR  and
REZA A. BEHBAHANI
FARZIN M. AGHAMIR
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 143399, Iran (aghamir@ut.ac.ir)
REZA A. BEHBAHANI
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 143399, Iran (aghamir@ut.ac.ir)
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Abstract

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The role of static inductance on ion beam emission in plasma focus devices, based on anomalous resistivity, is reported. The effect of gas pressure variation on the process of energy transfer into plasma is investigated and discussed by using Lee's model. The dependence of ion beam production on filling gas pressure along with change in static inductance is studied. The results show that increase of static inductance in a specific range of operating pressure can enhance the efficiency of dense plasma focus device.

Type
Letter
Information
Journal of Plasma Physics , Volume 78 , Issue 5 , October 2012 , pp. 585 - 588
Copyright
Copyright © Cambridge University Press 2012

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