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EELS Investigation of Al2O3 at 30 keV and below; First Results of Alumina's Structural Sensitivity to a Low-Energy Electron Beam

Published online by Cambridge University Press:  04 August 2017

Takeshi Sunaoshi ,
Manabu Shirai ,
Satoshi Okada ,
Kazutoshi Kaji  and
Edgar Voelkl
Takeshi Sunaoshi
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Manabu Shirai
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Satoshi Okada
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Kazutoshi Kaji
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Edgar Voelkl
Affiliation:
Hitachi High Technologies America, NSD, Clarksburg, Maryland, USA.

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1558 - 1559
Copyright
© Microscopy Society of America 2017 

References

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[4] Kimoto, K, Ishizuka, K, et al, Journal of Electron Microscopy 52(3 2003). pp 299–303.CrossRefGoogle Scholar
[5] Sunaoshi, T, Kaji, K, Orai, Y, Schamp, CT & Voelkl, E Microsc. Microanal 22(Suppl 3 2016 p604.Google Scholar
[6] Prof. Dr. R. Gauvin is thanked for his many useful discussions and contributions to this work.Google Scholar