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Gas Assisted E-beam Lithography Using the JSM-7600F Ultra-High Resolution Schottky FEG-SEM and OmniGIS

Published online by Cambridge University Press:  01 August 2010

N Erdman ,
A Laudate  and
C Hartfield
N Erdman
Affiliation:
JEOL USA
A Laudate
Affiliation:
JEOL USA
C Hartfield
Affiliation:
Omniprobe

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 58 - 59
Copyright
Copyright © Microscopy Society of America 2010