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Auger Ionization of Silicon Nanocrystals

Published online by Cambridge University Press:  15 February 2011

B. Averboukh
Affiliation:
Technische Universität München, Physik Department E16, Garching 85748, Germany
D. Kovalev
Affiliation:
Technische Universität München, Physik Department E16, Garching 85748, Germany
M. Ben Chorin
Affiliation:
Technische Universität München, Physik Department E16, Garching 85748, Germany
F. Koch
Affiliation:
Technische Universität München, Physik Department E16, Garching 85748, Germany
Al.L. Efros
Affiliation:
Nanostructure Optics Section, Naval Research Laboratory, Washington, DC, 20375 USA
M. Rosen
Affiliation:
Nanostructure Optics Section, Naval Research Laboratory, Washington, DC, 20375 USA
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Abstract

Photoluminescence saturation under intense CW optical excitation and optical degradation of photoluminescence from porous Si are studied. The anisotropy of the luminescence is observed under intense linearly polarized illumination at room temperature and after polarized light induced degradation at low temperature. The Auger process is shown to be responsible for these observations.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Mihalcescu, I., Vial, J.C., Bsiesy, A., Muller, F., Romenstain, R., Martin, E., Delenie, C., Lannoo, M. and Allan, G.. Phys. Rev., B51, p. 17605 (1995)Google Scholar
2.Kovalev, D., Averboukh, B., Ben Chorin, M., Koch, F., Efros, Al.L. and Rosen, M.. Phys. Rev. Lett. 77, p. 2089 (1996)Google Scholar
3.Andrianov, A.V., Kovalev, D.I., Zinov'ev, N.N. and Yaroshetskii, I.D.. JETP Lett., 58, p. 427 (1993)Google Scholar
4.Koyama, H. and Koshida, N.. Phys. Rev. B52, p. 2649 (1995)Google Scholar
5.Grivickas, V., Kolenda, J., Bernussi, A., Matvienko, B. and Basmaji, P.. Brazilian J. Phys. 24, p. 349 (1993)Google Scholar
6.Grivickas, V., Linnros, J. and Tellefsen, J.A.. Thin Solid Films, 255, p. 208 (1995)Google Scholar
7.Chepic, D.I., Efros, Al.L., Ekimov, A.I., Ivanov, M.G., Kharchenko, V.A., Kudriavtsev, I.A. and Yazeva, T.V.. J. Lumin. 47, p. 113 (1990)Google Scholar
8.Koos, M., Pocsik, I. and Vazsonyi, E.. Appl. Phys. Lett., 62, p. 1797 (1993)Google Scholar