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Initial Stages in the Growth of Oxide Thin Films by CVD
Published online by Cambridge University Press: 21 February 2011
Abstract
A technique has been developed for studying the early stages of heteroepitactic nucleation and growth of oxide thin films by TEM using direct deposition onto electron-transparent ceramic substrates. Observations of α-Fe2O3 island growth on four orientations of α-Al2O3 – (0001), {1102}, {1010}, and {1120} – are reported. Moir6 fringes and selected-area diffraction are used to show heteroepitactic growth. Island morphology is compared to known growth habits of hematite crystals. Preferential nucleation of islands at low-energy sites (e.g. surface steps) is also demonstrated.
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- Copyright © Materials Research Society 1990
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