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Nucleation and Growth Dependence of ALD WNC on Substrate Surface Condition
Published online by Cambridge University Press: 17 March 2011
Abstract
ALD WNC nucleation and growth was observed strongly affected by different substrate materials and surface chemistries. Nucleation was inhibited on most pristine low k surfaces, which is attributed to low concentrations of chemisorption sites (Si-OH). Plasma treatments were used to alter the surface chemistry to improve nucleation. Surface closure and surface roughness of the WNC layer were found to strongly correlate with starting surface condition. Resistivities of the resulting films were also found dependent on starting surface treatment. But the relationship between W content of the films, surface treatment and resistivity was not fully comprehended.
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