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Structure and Magnetic Properties of Epitaxial NiFe2O4 Films

Published online by Cambridge University Press:  15 February 2011

R. B. van Dover
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
S. Venzke
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
E. M. Gyorgy
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
T. Siegrist
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
J. M. Phillips
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
J. H. Marshall
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
R. J. Felder
Affiliation:
AT&T Bell Labs, Murray Hill, NJ 07974
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Abstract

We have made NiFe2O4 films by rf sputtering using the 90 °off-axis geometry. Films grown at 600°C on SrTiO3 and Y.15Zr.85O2 substrates are single crystals with (100) and (110) texture, respectively, but exhibit a very large and unexpected random anisotropy. A postdeposition air anneal at ˜1000°C has little effect on the crystallinity of the films but almost completely eliminates the random anisotropy; the remaining anisotropy is consistent with expected (bulk) values. A decrease of the saturation magnetization, indicating degradation, was observed for films on SrTiO3 (but not Y.15Zr.85O2) annealed at 1300°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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