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Structure and Mechanical Properties of Titanium Nitride, Zirconium Nitride, and Chromium Nitride Films by Reactive Magnetron-Sputter Deposition
Published online by Cambridge University Press: 10 February 2011
Abstract
TiN, ZrN, and CrN films were grown by reactive magnetron sputtering on WC-Co sintered hard alloy substrates. Hardness and elastic modulus were measured by nano-indentation tester with low load on tip at 200 mgf. Hardness values were shown the higher value the thinner film thickness due to stress in the films.
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- Copyright © Materials Research Society 1997
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