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Ultrathin, Epitaxial Aluminum Oxide on Nial(110)

Published online by Cambridge University Press:  25 February 2011

M. Wuttig ,
W. Hioffmann ,
R. Jaeger ,
I.L. KuHlenbeck  and
I.L. Freundi
M. Wuttig
Affiliation:
IGV/ Forschungszentrum KFA.Jülich, W-5170 Jü1ich, Germany
W. Hioffmann
Affiliation:
IGV/ Forschungszentrum KFA.Jülich, W-5170 Jü1ich, Germany
R. Jaeger
Affiliation:
Ruhr-Universität Bochum, Postfach 102148, W-4630 Bochum, Germany
I.L. KuHlenbeck
Affiliation:
Ruhr-Universität Bochum, Postfach 102148, W-4630 Bochum, Germany
I.L. Freundi
Affiliation:
Ruhr-Universität Bochum, Postfach 102148, W-4630 Bochum, Germany
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Abstract

The geometric and electronic structure of ultrathin oxide films grown by oxidation of NiAI(110) was studied by LEED (low energy electron diffraction), EELS (electron energy loss spectroscopy), XPS (X-ray photoelectron spectroscopy) and ARUPS (angle resolved ultraviolet photoelectron spectroscopy). Two diffcrent ultrathin aluminum oxide films have been observed which are characterized by a hexagonal arrangement of oxygen atoms. The films are approximately 5 Å thick, most likely consisting of two alternating oxygen - aluminum layers and are oxygen terminated. The second oxide phase shows close similarities with the (111) face of γ − A12O3 and the (0001) face of α – A12O3 respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 221: Symposium C – Heteroepitaxy of Dissimilar Materials , 1991 , 143
Copyright
Copyright © Materials Research Society 1991

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References

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