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Zinc Oxide/Copper Oxide Mixed Films Deposited by CVD

Published online by Cambridge University Press:  21 March 2011

Yuneng Chang  and
Chihhsiang Yeh
Yuneng Chang
Affiliation:
Lunghwa Institute of Technology, Deptartment of Chemical Engineering, Gueishan, Taoyuan, TaiwanR.O.C.
Chihhsiang Yeh
Affiliation:
Lunghwa Institute of Technology, Deptartment of Chemical Engineering, Gueishan, Taoyuan, TaiwanR.O.C.
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Abstract

Metal organic chemical vapor deposition (MOCVD) was used to prepare ZnO/Cu2O mixed films. The process condition studied were: deposition temperature from 360oC to 440oC, partial pressures of oxygen, 190-380 torr, precursor copper acetylacetonate (Cu(acac)2), 0.21 torr, and zinc acetylacetonate(Zn(acac)2), 0.45 torr. AES and XPS analysis showed average elemental content being Cu, 52-66%, Zn, 11-20%, O, 30-40%. Copper presented primarily as Cu(I) ions, and Zn as Zn(II) ions. SEM, SAM and XRD indicated that deposited films were polycrystalline with composite structure. Some films had a continuous ZnO thin layer with flat surface, equiax fine grained. On the top of ZnO layer were covered by discrete, irregular shape, coarse Cu2O grains. Primary Cu2O phases were (110), (111), and (200) orientation. ZnO phases were (002), and (103). SEM showed the impact of deposition temperature on Cu2O grain size. Such data were used to estimate the activation energy for grain growth. In fact, to our experiences from these studies, binary metal oxide CVD showed a wide spectrum of film microstructure and morphology. These phenomena reflect the result caused by both thermodynamics as film composition, and kinetics as mass transfer/ surface reaction rate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O8.37
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Miller, B.J.A., Self, V.A., Chapman, S.M., and Sermon, P.A., J. Mater. Chem., 7(10), 2155 (1997).Google Scholar
2. Puchert, M.K., Hartmann, A., Lamb, R.N., and Martin, J.W., J. Mater. Res., 11, no.10, 2463 (1996). a) J. Frenkel, Z. Phys., 35, 652 (1926), b) C. Wagner, W. Schottky, Z. Phys. Chem., Abt. B11, 163 (1930).c) H.K. Henisch, Rectifying Semiconductor Contacts (Oxford University Press, London, 1957), pp.88-94.Google Scholar
3. Tanaka, T., Ibaraka, T., and Fujinaka, M., Thin Sold Films, 189,9 (1990).Google Scholar
4. Savage, J.A. and Dodsom, E.M., J. Mater. Science 4, 809 (1969).Google Scholar
5. Labau, M, Rey, P., and Delabouglise, G., Thin Sold Films, 213, 94 (1992).Google Scholar
6. Chang, Yuneng, “Organometallic Chemical vapor deposition of copper oxide thin films”, p. 75, Ph.D. Thesis, Iowa Sate Univ., Ames, IA (1992).Google Scholar
7. Wynblatt, D P., and Cune, R.C. Mc, “Surface segregation in metal oxides”, p. 263, Surface and Near Surface Chemistry of Oxide Materials, Elsevier, Netherlands(1990).Google Scholar
8. Chang, L.L., “Molecular Beam Epitaxy”, Handbook on semiconductor, vol. 3, Keller, S.P. ed., North-Holland, Amsterdam, (1980).Google Scholar
9. Smith, D.L., “Chap.5, Deposition”, Thin Film Deposition, Principles & Practice, McGraw-Hill (1999).Google Scholar
10. James, L., ”Coordinate bond energies and inner orbital splitting in some tervalent transition metal acetylacetonates”, Inorganic chemistry, 3, No.11, 1553 (1964).Google Scholar
11. Teghil, R., “A thermodynamic study of the sublimation process of aluminum and copper acetylacetonates”, Thermochimica acta, 44, 213 (1981).Google Scholar
12. Miller, B.J.A., Sermon, P.A., J. Mater.Chem.,7(10) (1997) 2155 Google Scholar
13. Giamello, E., Bolis, V., Applied Catalysis, 36 (1988) 287 Google Scholar
14. Siefering, K/L/, Griffin, G.L., Surface Science, 207 (1989) 525 Google Scholar
15. Nakamura, Y., Watanabe, K., J. Catalysis, 153 (1995) 350 Google Scholar
16. Campos-Martin, J.M., Fierro, J.L.G., J. Catalysis, 156 (1995) 208 Google Scholar
17. Tanaka, T., Ibaraki, T., Thin Sold Films, 189 (1990) 9 Google Scholar
18. Puchert, M.K., Lamb, R.N., Martin, J.W., J. Mater. Res. Vol.11, No.2, (1996) 2463 Google Scholar
19. Savage, J. A., Dodson, E.M., J. Materials Science, 4 (1969) 809 Google Scholar
20. Labeau, M., Delabouglise, G., Thin Solid Films, 213 (1992) 94 Google Scholar
21. Minami, T., Sato, H., Thin Solid Films, 253 (1994) 14 Google Scholar
22. Chang, Y., Schrader, G.L., Mater. Res. Soc. Symp, Proc. 250 (1992) 291 Google Scholar
23. Condorelli, G.G., Fragala, I., Chem. Mater, 7 (1995) 2096 Google Scholar
24. Condorelli, G.G., Fragala, I., Chem. Mater, 6 (1994) 1861 Google Scholar