Resonant Scheme for Interferometric Lithography Improves Spatial Resolution Beyond Diffraction Limit

Joan J. Carvajal

doi:10.1557/mrs2008.95

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Resonant Scheme for Interferometric Lithography Improves Spatial Resolution Beyond Diffraction Limit

Published online by Cambridge University Press: 31 January 2011

Joan J. Carvajal

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Type: Research/Researchers
Information: MRS Bulletin , Volume 33 , Issue 5: Molecular Biomimetics , May 2008 , pp. 492

DOI: https://doi.org/10.1557/mrs2008.95 [Opens in a new window]
Copyright: Copyright © Materials Research Society 2008

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Resonant Scheme for Interferometric Lithography Improves Spatial Resolution Beyond Diffraction Limit

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