Hostname: page-component-7bb8b95d7b-l4ctd Total loading time: 0 Render date: 2024-09-22T23:57:18.627Z Has data issue: false hasContentIssue false

Effect of Growth Temperature and Annealing on ZnO

Published online by Cambridge University Press:  11 February 2011

A. L. Cai
Affiliation:
ECE Department, North Carolina State University
J. F. Muth
Affiliation:
ECE Department, North Carolina State University
M. J. Reed
Affiliation:
ECE Department, North Carolina State University
H. L. Porter
Affiliation:
Materials Science and Engineering Department
C. Jin
Affiliation:
Materials Science and Engineering Department
J. Narayan
Affiliation:
Materials Science and Engineering Department
Get access

Abstract

A series of epitaxial single crystal ZnO samples were grown by Pulsed Laser Deposition (PLD) on c-axis, double-side polished sapphire at temperatures ranging from 600°C to 800°C. A comprehensive optical study, consisting of cathodoluminescence (CL) and transmission spectroscopy measurements, was performed before and after annealing the samples in air and oxygen environments. The structural characteristics of the films were observed by x-ray diffraction and transmission electron microscopy (TEM). Using these measurements, the data revealed that annealing significantly improved the luminescence and exciton line-width of the better material grown at the higher end of the temperature range. In lower quality samples grown at the lower end of the temperature range, the optical quality of the material was degraded. In the samples grown at higher temperatures, annealing improved the optical qualities. An increase in the below band-gap, green band emission was also observed under some annealing conditions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Bagnall, D. M., Chen, Y. F., Zhu, Z., Tao, T., Shen, M. Y., and Goto, T., Appl. Phys. Lett. 73, 1038 (1998)Google Scholar
2 Reynolds, D. C., Look, D. C., Jogai, B., and Morkoc, H., Solid State Commun. 101. 643 (1997)Google Scholar
3 Hong, S. K., Ko, H. J., Chen, Y., Hanada, T., and Yao, T., J. Vac. Sci. Technol. B, 18, 2313(2000)Google Scholar
4 Sheng, H., Muthukumar, S., Emanetoglu, N. W., and Lu, Y., Appl. Phys. Lett. 80, 2132 (2002)Google Scholar
5 Zhang, S. B., Wei, S.-H., and Zunger, A., Phys. Rev, B63, 75205(2001)Google Scholar
6 Eason, David, Eagle-Picher Technologies, “Growth and Characterization of p-type ZnO thin films by MBE”, 2002 MRS Workshop Series, Second International Workshop on Zinc Oxide, October 23, 2002 Google Scholar
7 Muth, J. F., Kolbas, R. M., Sharma, A. K., Oktyabrsky, S., and Narayan, J., J. Appl. Phys., 85, 7884(1999)Google Scholar
8 Srikant, V. and Clarke, D. R., J. Appl. Phys. 81, 6357 (1997)Google Scholar
9 Gupta, Vinay and Mansingh, Abhai, J. Appl. Phys. 80, 1063(1996)Google Scholar
10 Narayan, J., Dovidenko, K., Sharma, A. K., and Oktyabrsky, S., J. Appl. Phys. 84, 2597(1998)Google Scholar
11 Reynolds, D.C., Look, D.C., Jogai, B., Van Nostrand, J.E., Jones, R. and Jenny, J., Solid State Commu. 106, 701, (1998)Google Scholar
12 Ryu, M. K., Lee, S. H., Jang, M. S., Panin, G.N. and Kang, T. W., J. Appl. Phys., 92, 154 (2002)Google Scholar
13 Vanheusden, K., Seager, C. H., Warren, W. L., Tallant, D. R., and Voigt, J. A., Appl. Phys. Lett. 68, 403 (1996).Google Scholar