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Investigation of Hydrogen Storage Using Combinatorial Thin Films and IR Imaging

Published online by Cambridge University Press:  01 February 2011

Hiroyuki Oguchi ,
Ichiro Takeuchi ,
Daniel Josell ,
Edwin J Heilweil  and
Leonid A Bendersky
Hiroyuki Oguchi
Affiliation:
ohguchi@mail.umd.edu, University of Maryland, Department of Materials Science and Engineering, University of Maryalnd, College Park, MD, 20742, United States
Ichiro Takeuchi
Affiliation:
takeuchi@umd.edu, University of Maryland, College Park, MD, 20742, United States
Daniel Josell
Affiliation:
daniel.josel@nist.gov, National Institute of Standards and Technology, Gaithersburg, MD, 20899, United States
Edwin J Heilweil
Affiliation:
edwin.heilweil@nist.gov, National Institute of Standards and Technology, Gaithersburg, MD, 20899, United States
Leonid A Bendersky
Affiliation:
leoben@nist.gov, National Institute of Standards and Technology, Gaithersburg, MD, 20899, United States
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Abstract

Three 100 nm-thick Mgx(TM)1-x (TM = Ni and Ti) composition spread thin films having compositional variation 0.4<x<0.95 and capped with a 5 nm-thick Pd layer were deposited in combinatorial electron-beam (e-beam) deposition chamber. Crystallinity of the films was characterized by scanning x-ray diffraction (XRD) and cross-sectional transmission electron microscopy (TEM). Hydrogen absorption and desorption of the films were monitored with an infrared (IR) camera that could image a full area of the films. The observed changes in IR intensity due to hydrogen absorption/desorption demonstrated sensitivity of the method to the differences in compostion, microstructure and type of TM.

Keywords

hydrogenationcombinatorial synthesisthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1042: Symposium S – Materials and Technology for Hydrogen Storage , 2007 , 1042-S01-11
Copyright
Copyright © Materials Research Society 2008

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