Hostname: page-component-848d4c4894-5nwft Total loading time: 0 Render date: 2024-05-13T18:37:31.901Z Has data issue: false hasContentIssue false

Characterization of Porous Pt/Al2O3 Films Produced by Hybrid Gas-to-Particle Conversion and Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Quynh T. Nguyen
Affiliation:
Department of Chemical Engineering, University of Maryland, College Park, MD 20742, U.S.A.
Sheryl H. Ehrman
Affiliation:
Department of Chemical Engineering, University of Maryland, College Park, MD 20742, U.S.A.
Get access

Abstract

A hybrid process, based upon gas-to-particle conversion and chemical vapor deposition, is presented as an alternative technique for producing porous films with the main advantage of solvent-free, low-substrate temperature operation. Starting from precursors of platinum acetylacetonate and aluminum acetylacetonate, nanoparticles were produced by chemical reaction followed by gas-to-particle conversion. Downstream of this reaction zone, these nanoparticles were collected via thermophoresis onto a cooled substrate forming a porous, nanocermet film that may have possible uses in catalytic, sensor, or coating applications.

In this study, Pt/Alumina nanocermet films were produced by two routes: either simultaneous precursor injection processing or a layer-by-layer approach. Energy-dispersive X-ray spectroscopy revealed that this hybrid process results in reasonable control of the amount of Pt within each sample. From transmission electron spectroscopy images taken of films produced by simultaneous processing, Pt nanoparticles appear to be co-agglomerated with alumina. The results may identify changes that can be made to the process to improve properties, such as catalytic activity, in the nanocermet films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Nettleship, I., Key Engng. Mat. 122, 305 (1996).Google Scholar
2. Nitta, S. V., Pisupatti, V., Jain, A., Wayner, P. C., Gill, W. N., and Plawsky, J. L., J. Vac. Sci. Technol. B 17, 205 (1999).Google Scholar
3. Watanabe, M., Uchida, H., Seki, Y., and Emori, M., J. Electrochem. Soc. 143, 3847 (1996).Google Scholar
4. O'Reagan, B. and Gratzel, M., Nature 353, 737 (1991).Google Scholar
5. Verweij, H., Adv. Mater. 10, 1483 (1998).Google Scholar
6. Libuda, J., Baumer, M., and Freund, H.-J., J. Vac. Sci. Technol. A 12, 2259 (1994).Google Scholar
7. Gibaud, A., Hazra, S., Sella, C., Laffez, P., Desert, A., Naudon, A., and Tendeloo, G. V., Phys. Rev. B 63, 193407–1 (2001).Google Scholar
8. Thornton, J. A. and Lamb, J. L., Sol Energy Mater. 9, 415 (1984).Google Scholar
9. Nguyen, Q.T., Kidder, J.N Jr., and Ehrman, S.H., Thin Solid Films, 410, 42 (2002).Google Scholar
10. Maruyama, T. and Arai, S., Appl. Phys. Lett. 60, 322 (1992).Google Scholar
11. Kim, J. S., Marzouk, H. A., Reucroft, P. J., Robertson, J. D., and Hamrin, C. E. Jr., Appl. Phys. Lett. 62, 681 (1993).Google Scholar
12. Battiston, G. A., Gerbasi, R., Porchia, M., and Gasparotto, A., Chem. Vapor Depos. 5, 13 (1999).Google Scholar
13. Arndt, J., Klippe, L., Stolle, R., and Wahl, G., J. Phys. IV 5 C5–C5 (1995).Google Scholar