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Native Grass Establishment following Application of Pyridine Herbicides
- Rodney G. Lym, Roger L. Becker, Michael J. Moechnig, Mary B. Halstvedt, Vanelle F. Peterson
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- Journal:
- Invasive Plant Science and Management / Volume 10 / Issue 1 / March 2017
- Published online by Cambridge University Press:
- 12 April 2017, pp. 110-117
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Invasive species management is often more successful if desirable species are seeded after the target weed is controlled. However, control of invasive plants must be maintained following reseeding or the seeded species may fail to establish. A regional study conducted in Minnesota, North Dakota, and South Dakota evaluated the effect of aminopyralid, clopyralid, or picloram applied in the fall prior to fall-dormant seeding or seeding the following spring on cool- and warm-season native grass species establishment. Herbicides were applied at standard rates used to control invasive broadleaf weeds in the upper midwestern tallgrass prairie region of the United States. Cool-season species included Canada wildrye, green needlegrass, and intermediate wheatgrass. Warm-season species included big bluestem, little bluestem, sideoats grama, switchgrass, and Indiangrass. Aminopyralid did not reduce seedling establishment in either fall or spring seeding. Grasses generally were not affected by a pretreatment of the pyridine standards clopyralid or picloram either, with the exception of a slight reduction in fall-seeded establishment of intermediate wheatgrass. Picloram also slightly reduced fall-seeded establishment of Canada wildrye. Application of aminopyralid can safely be used to control susceptible invasive species preceding grass species establishment, with a safety margin similar to or slightly better than that with the pyridine standards clopyralid or picloram.
Contributors
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- By Mitchell Aboulafia, Frederick Adams, Marilyn McCord Adams, Robert M. Adams, Laird Addis, James W. Allard, David Allison, William P. Alston, Karl Ameriks, C. Anthony Anderson, David Leech Anderson, Lanier Anderson, Roger Ariew, David Armstrong, Denis G. Arnold, E. J. Ashworth, Margaret Atherton, Robin Attfield, Bruce Aune, Edward Wilson Averill, Jody Azzouni, Kent Bach, Andrew Bailey, Lynne Rudder Baker, Thomas R. Baldwin, Jon Barwise, George Bealer, William Bechtel, Lawrence C. Becker, Mark A. Bedau, Ernst Behler, José A. Benardete, Ermanno Bencivenga, Jan Berg, Michael Bergmann, Robert L. Bernasconi, Sven Bernecker, Bernard Berofsky, Rod Bertolet, Charles J. Beyer, Christian Beyer, Joseph Bien, Joseph Bien, Peg Birmingham, Ivan Boh, James Bohman, Daniel Bonevac, Laurence BonJour, William J. Bouwsma, Raymond D. Bradley, Myles Brand, Richard B. Brandt, Michael E. Bratman, Stephen E. Braude, Daniel Breazeale, Angela Breitenbach, Jason Bridges, David O. Brink, Gordon G. Brittan, Justin Broackes, Dan W. Brock, Aaron Bronfman, Jeffrey E. Brower, Bartosz Brozek, Anthony Brueckner, Jeffrey Bub, Lara Buchak, Otavio Bueno, Ann E. Bumpus, Robert W. Burch, John Burgess, Arthur W. Burks, Panayot Butchvarov, Robert E. Butts, Marina Bykova, Patrick Byrne, David Carr, Noël Carroll, Edward S. Casey, Victor Caston, Victor Caston, Albert Casullo, Robert L. Causey, Alan K. L. Chan, Ruth Chang, Deen K. Chatterjee, Andrew Chignell, Roderick M. Chisholm, Kelly J. Clark, E. J. Coffman, Robin Collins, Brian P. Copenhaver, John Corcoran, John Cottingham, Roger Crisp, Frederick J. Crosson, Antonio S. Cua, Phillip D. Cummins, Martin Curd, Adam Cureton, Andrew Cutrofello, Stephen Darwall, Paul Sheldon Davies, Wayne A. Davis, Timothy Joseph Day, Claudio de Almeida, Mario De Caro, Mario De Caro, John Deigh, C. F. Delaney, Daniel C. Dennett, Michael R. DePaul, Michael Detlefsen, Daniel Trent Devereux, Philip E. Devine, John M. Dillon, Martin C. Dillon, Robert DiSalle, Mary Domski, Alan Donagan, Paul Draper, Fred Dretske, Mircea Dumitru, Wilhelm Dupré, Gerald Dworkin, John Earman, Ellery Eells, Catherine Z. Elgin, Berent Enç, Ronald P. Endicott, Edward Erwin, John Etchemendy, C. Stephen Evans, Susan L. Feagin, Solomon Feferman, Richard Feldman, Arthur Fine, Maurice A. Finocchiaro, William FitzPatrick, Richard E. Flathman, Gvozden Flego, Richard Foley, Graeme Forbes, Rainer Forst, Malcolm R. Forster, Daniel Fouke, Patrick Francken, Samuel Freeman, Elizabeth Fricker, Miranda Fricker, Michael Friedman, Michael Fuerstein, Richard A. Fumerton, Alan Gabbey, Pieranna Garavaso, Daniel Garber, Jorge L. A. Garcia, Robert K. Garcia, Don Garrett, Philip Gasper, Gerald Gaus, Berys Gaut, Bernard Gert, Roger F. Gibson, Cody Gilmore, Carl Ginet, Alan H. Goldman, Alvin I. Goldman, Alfonso Gömez-Lobo, Lenn E. Goodman, Robert M. Gordon, Stefan Gosepath, Jorge J. E. Gracia, Daniel W. Graham, George A. Graham, Peter J. Graham, Richard E. Grandy, I. Grattan-Guinness, John Greco, Philip T. Grier, Nicholas Griffin, Nicholas Griffin, David A. Griffiths, Paul J. Griffiths, Stephen R. Grimm, Charles L. Griswold, Charles B. Guignon, Pete A. Y. Gunter, Dimitri Gutas, Gary Gutting, Paul Guyer, Kwame Gyekye, Oscar A. Haac, Raul Hakli, Raul Hakli, Michael Hallett, Edward C. Halper, Jean Hampton, R. James Hankinson, K. R. Hanley, Russell Hardin, Robert M. Harnish, William Harper, David Harrah, Kevin Hart, Ali Hasan, William Hasker, John Haugeland, Roger Hausheer, William Heald, Peter Heath, Richard Heck, John F. Heil, Vincent F. Hendricks, Stephen Hetherington, Francis Heylighen, Kathleen Marie Higgins, Risto Hilpinen, Harold T. Hodes, Joshua Hoffman, Alan Holland, Robert L. Holmes, Richard Holton, Brad W. Hooker, Terence E. Horgan, Tamara Horowitz, Paul Horwich, Vittorio Hösle, Paul Hoβfeld, Daniel Howard-Snyder, Frances Howard-Snyder, Anne Hudson, Deal W. Hudson, Carl A. Huffman, David L. Hull, Patricia Huntington, Thomas Hurka, Paul Hurley, Rosalind Hursthouse, Guillermo Hurtado, Ronald E. Hustwit, Sarah Hutton, Jonathan Jenkins Ichikawa, Harry A. Ide, David Ingram, Philip J. Ivanhoe, Alfred L. Ivry, Frank Jackson, Dale Jacquette, Joseph Jedwab, Richard Jeffrey, David Alan Johnson, Edward Johnson, Mark D. Jordan, Richard Joyce, Hwa Yol Jung, Robert Hillary Kane, Tomis Kapitan, Jacquelyn Ann K. Kegley, James A. Keller, Ralph Kennedy, Sergei Khoruzhii, Jaegwon Kim, Yersu Kim, Nathan L. King, Patricia Kitcher, Peter D. Klein, E. D. Klemke, Virginia Klenk, George L. Kline, Christian Klotz, Simo Knuuttila, Joseph J. Kockelmans, Konstantin Kolenda, Sebastian Tomasz Kołodziejczyk, Isaac Kramnick, Richard Kraut, Fred Kroon, Manfred Kuehn, Steven T. Kuhn, Henry E. Kyburg, John Lachs, Jennifer Lackey, Stephen E. Lahey, Andrea Lavazza, Thomas H. Leahey, Joo Heung Lee, Keith Lehrer, Dorothy Leland, Noah M. Lemos, Ernest LePore, Sarah-Jane Leslie, Isaac Levi, Andrew Levine, Alan E. Lewis, Daniel E. Little, Shu-hsien Liu, Shu-hsien Liu, Alan K. L. Chan, Brian Loar, Lawrence B. Lombard, John Longeway, Dominic McIver Lopes, Michael J. Loux, E. J. Lowe, Steven Luper, Eugene C. Luschei, William G. Lycan, David Lyons, David Macarthur, Danielle Macbeth, Scott MacDonald, Jacob L. Mackey, Louis H. Mackey, Penelope Mackie, Edward H. Madden, Penelope Maddy, G. B. Madison, Bernd Magnus, Pekka Mäkelä, Rudolf A. Makkreel, David Manley, William E. Mann (W.E.M.), Vladimir Marchenkov, Peter Markie, Jean-Pierre Marquis, Ausonio Marras, Mike W. Martin, A. P. Martinich, William L. McBride, David McCabe, Storrs McCall, Hugh J. McCann, Robert N. McCauley, John J. McDermott, Sarah McGrath, Ralph McInerny, Daniel J. McKaughan, Thomas McKay, Michael McKinsey, Brian P. McLaughlin, Ernan McMullin, Anthonie Meijers, Jack W. Meiland, William Jason Melanson, Alfred R. Mele, Joseph R. Mendola, Christopher Menzel, Michael J. Meyer, Christian B. Miller, David W. Miller, Peter Millican, Robert N. Minor, Phillip Mitsis, James A. Montmarquet, Michael S. Moore, Tim Moore, Benjamin Morison, Donald R. Morrison, Stephen J. Morse, Paul K. Moser, Alexander P. D. Mourelatos, Ian Mueller, James Bernard Murphy, Mark C. Murphy, Steven Nadler, Jan Narveson, Alan Nelson, Jerome Neu, Samuel Newlands, Kai Nielsen, Ilkka Niiniluoto, Carlos G. Noreña, Calvin G. Normore, David Fate Norton, Nikolaj Nottelmann, Donald Nute, David S. Oderberg, Steve Odin, Michael O’Rourke, Willard G. Oxtoby, Heinz Paetzold, George S. Pappas, Anthony J. Parel, Lydia Patton, R. P. Peerenboom, Francis Jeffry Pelletier, Adriaan T. Peperzak, Derk Pereboom, Jaroslav Peregrin, Glen Pettigrove, Philip Pettit, Edmund L. Pincoffs, Andrew Pinsent, Robert B. Pippin, Alvin Plantinga, Louis P. Pojman, Richard H. Popkin, John F. Post, Carl J. Posy, William J. Prior, Richard Purtill, Michael Quante, Philip L. Quinn, Philip L. Quinn, Elizabeth S. Radcliffe, Diana Raffman, Gerard Raulet, Stephen L. Read, Andrews Reath, Andrew Reisner, Nicholas Rescher, Henry S. Richardson, Robert C. Richardson, Thomas Ricketts, Wayne D. Riggs, Mark Roberts, Robert C. Roberts, Luke Robinson, Alexander Rosenberg, Gary Rosenkranz, Bernice Glatzer Rosenthal, Adina L. Roskies, William L. Rowe, T. M. Rudavsky, Michael Ruse, Bruce Russell, Lilly-Marlene Russow, Dan Ryder, R. M. Sainsbury, Joseph Salerno, Nathan Salmon, Wesley C. Salmon, Constantine Sandis, David H. Sanford, Marco Santambrogio, David Sapire, Ruth A. Saunders, Geoffrey Sayre-McCord, Charles Sayward, James P. Scanlan, Richard Schacht, Tamar Schapiro, Frederick F. Schmitt, Jerome B. Schneewind, Calvin O. Schrag, Alan D. Schrift, George F. Schumm, Jean-Loup Seban, David N. Sedley, Kenneth Seeskin, Krister Segerberg, Charlene Haddock Seigfried, Dennis M. Senchuk, James F. Sennett, William Lad Sessions, Stewart Shapiro, Tommie Shelby, Donald W. Sherburne, Christopher Shields, Roger A. Shiner, Sydney Shoemaker, Robert K. Shope, Kwong-loi Shun, Wilfried Sieg, A. John Simmons, Robert L. Simon, Marcus G. Singer, Georgette Sinkler, Walter Sinnott-Armstrong, Matti T. Sintonen, Lawrence Sklar, Brian Skyrms, Robert C. Sleigh, Michael Anthony Slote, Hans Sluga, Barry Smith, Michael Smith, Robin Smith, Robert Sokolowski, Robert C. Solomon, Marta Soniewicka, Philip Soper, Ernest Sosa, Nicholas Southwood, Paul Vincent Spade, T. L. S. Sprigge, Eric O. Springsted, George J. Stack, Rebecca Stangl, Jason Stanley, Florian Steinberger, Sören Stenlund, Christopher Stephens, James P. Sterba, Josef Stern, Matthias Steup, M. A. Stewart, Leopold Stubenberg, Edith Dudley Sulla, Frederick Suppe, Jere Paul Surber, David George Sussman, Sigrún Svavarsdóttir, Zeno G. Swijtink, Richard Swinburne, Charles C. Taliaferro, Robert B. Talisse, John Tasioulas, Paul Teller, Larry S. Temkin, Mark Textor, H. S. Thayer, Peter Thielke, Alan Thomas, Amie L. Thomasson, Katherine Thomson-Jones, Joshua C. Thurow, Vzalerie Tiberius, Terrence N. Tice, Paul Tidman, Mark C. Timmons, William Tolhurst, James E. Tomberlin, Rosemarie Tong, Lawrence Torcello, Kelly Trogdon, J. D. Trout, Robert E. Tully, Raimo Tuomela, John Turri, Martin M. Tweedale, Thomas Uebel, Jennifer Uleman, James Van Cleve, Harry van der Linden, Peter van Inwagen, Bryan W. Van Norden, René van Woudenberg, Donald Phillip Verene, Samantha Vice, Thomas Vinci, Donald Wayne Viney, Barbara Von Eckardt, Peter B. M. Vranas, Steven J. Wagner, William J. Wainwright, Paul E. Walker, Robert E. Wall, Craig Walton, Douglas Walton, Eric Watkins, Richard A. Watson, Michael V. Wedin, Rudolph H. Weingartner, Paul Weirich, Paul J. Weithman, Carl Wellman, Howard Wettstein, Samuel C. Wheeler, Stephen A. White, Jennifer Whiting, Edward R. Wierenga, Michael Williams, Fred Wilson, W. Kent Wilson, Kenneth P. Winkler, John F. Wippel, Jan Woleński, Allan B. Wolter, Nicholas P. Wolterstorff, Rega Wood, W. Jay Wood, Paul Woodruff, Alison Wylie, Gideon Yaffe, Takashi Yagisawa, Yutaka Yamamoto, Keith E. Yandell, Xiaomei Yang, Dean Zimmerman, Günter Zoller, Catherine Zuckert, Michael Zuckert, Jack A. Zupko (J.A.Z.)
- Edited by Robert Audi, University of Notre Dame, Indiana
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- Book:
- The Cambridge Dictionary of Philosophy
- Published online:
- 05 August 2015
- Print publication:
- 27 April 2015, pp ix-xxx
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Notes on Contributors
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- By Adam H. Becker, Michael Bernard-Donals, Mary Cappello, Maria DiBattista, Leland de la Durantaye, John V. Fleming, Eli Friedlander, Alastair Hannay, Trudier Harris, Lawrence D. Kritzman, Alfred MacAdam, Patrick Madden, Deborah Epstein Nord, Jean-Michel Rabaté, Robert F. Sayre, Frances Wilson, Emily O. Wittman
- Edited by Maria DiBattista, Princeton University, New Jersey, Emily O. Wittman, University of Alabama, Tuscaloosa
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- Book:
- The Cambridge Companion to Autobiography
- Published online:
- 05 May 2014
- Print publication:
- 22 May 2014, pp ix-xii
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Deformation of Porous, Nanostructured Silver at Room Temperature and 150 °C
- Guillaume Noiseau, Michael F. Becker, John W. Keto, Desiderio Kovar
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1513 / 2013
- Published online by Cambridge University Press:
- 09 August 2013, mrsf12-1513-gg10-01
- Print publication:
- 2013
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Porous, nanostructured silver samples were produced using a direct-write method where a nanoparticle aerosol consisting of particles with a mean size of approximately 5 nm were accelerated to speeds of approximately 1000 m/sec and impacted onto a translating substrate [1]. The impacting particles have sufficient energy to stick to the substrate, allowing patterned thick films to be directly written from the aerosol without a mask. Unlike other low temperature processing routes for achieving patterned films, no organics are added that can interfere with postdeposition processing. Typical films are 5- 100 μm thick, up to several centimeters long, and have an as-deposited relative densities as high as 70% of bulk Ag. Compression tests were carried out in steps at room temperature and at 150°C under constant displacement rates. Local strain and densification were measured by optical profilometry between each compression step. The results can be used as a starting point to better understand the mechanisms that govern plasticity, creep, and sintering in nanostructured, porous silver at low processing temperatures.
Compositional and microstructural evolution during annealing of Terfenol-D nanoparticulate films
- James Ma, Michael F. Becker, John W. Keto, Desiderio Kovar
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- Journal:
- Journal of Materials Research / Volume 26 / Issue 20 / 28 October 2011
- Published online by Cambridge University Press:
- 24 August 2011, pp. 2672-2681
- Print publication:
- 28 October 2011
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Although highly magnetostrictive thin films of Terfenol-D have been produced by a variety of methods, high-quality thick films have proved to be far more challenging to produce. To date, thick film processes have resulted in nanoparticulate films that contain significant porosity that reduces stiffness and results in oxidation and poor magnetostrictive performance. With the goal of understanding microstructural and compositional factors that affect performance, nanoparticulate Terfenol-D thick films were produced by laser ablation of microparticle aerosols combined with supersonic impaction. X-ray diffraction, scanning electron microscopy, transmission electron microscopy, x-ray photon spectroscopy, and magnetic measurements were performed on nanoparticles and on films as-deposited and after annealing in vacuum or in a reducing atmosphere. These measurements show that segregation occurs during oxidation of the films, prior to annealing, and results in films with poor magnetostriction. The segregation persists during annealing with no visible changes to the morphology or density of the nanoparticulate films exposed to temperatures as high as 800 °C. These results suggest that oxidation and segregation must be avoided to produce highly magnetostrictive thick films.
Metal and Metal-oxide Nanoparticle Synthesis by Laser Ablation of Aqueous Aerosols
- Kristofer L. Gleason, John W. Keto, Desiderio Kovar, Michael F. Becker
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1365 / 2011
- Published online by Cambridge University Press:
- 19 September 2011, mrss11-1365-tt03-02
- Print publication:
- 2011
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We present a scalable, continuous manufacturing method of nanoparticle production based on laser ablation of an aerosol generated from an aqueous precursor solution. A Collison nebulizer is used to generate a mist of ~10 μm diameter water droplets containing dissolved transition metal salts, suspended in 1 atmosphere of buffer gas. Water from the droplets quickly evaporates, leaving solid particles ~2 μm in diameter for a typical solution concentration. These microparticles are then ablated by a pulsed KrF excimer laser (10 ns, λ = 248 nm, 2 J/cm2 at focus). Ablation results in plasma breakdown of the microparticle and photothermal decomposition of the precursor material. Following ablation, nanoparticles 5-20 nm in diameter are formed and collected. For AgNO3 ablated in He gas, metal Ag nanoparticles were produced. For Cu(NO3)2 ablated in He, crystalline Cu2O nanoparticles were produced. For Ni(NO3)2 ablated in He, crystalline NiO nanoparticles were produced. A combination of AgNO3 and Cu(NO3)2 ablated in a reducing atmosphere of 10% H2 and 90% He yielded Ag-Cu alloy nanoparticles. In contrast to conventional wet-chemical synthesis processes, our nanoparticles are formed ‘bare,’ without surfactants or organic material contaminating the surface. Owing to their small size and high free surface area, nanoparticles produced by this process are ideally suited for applications that include catalysis and facilitated transport membranes.
A novel method for the determination of optical properties of absorbing thin films with thickness variations
- Jonghoon Baek, Desiderio Kovar, John W. Keto, Michael F. Becker
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- Journal:
- MRS Online Proceedings Library Archive / Volume 894 / 2005
- Published online by Cambridge University Press:
- 26 February 2011, 0894-LL03-20
- Print publication:
- 2005
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Non-uniformity in the thickness of thin films can severely distort their transmission spectra as compared to those of flat, smooth films. Methods that extract properties such as refractive index, thickness, and extinction coefficient of such films can suffer inaccuracies when applied to wedged or rough films. In order to accurately extract optical properties of non-uniform films, we have developed a novel numerical method and efficient constitutive relations that can determine film properties from just the transmission spectrum. The Optimum Parameter Extraction (OPE) method can accommodate transparent or absorbing films thickness variations that result in significant errors in the values of refractive index and film thickness if not considered. A packing-density model was proposed and used for refractive index to accelerate the fitting routine and to avoid finding local minima instead of the global minimum. In this model, refractive index has one fitting parameter, the packing density, p. Therefore, the OPE method takes a shorter time and produces more accurate results than many other methods. We show that for actual PLD (Pulsed Laser Deposition) AlN thin films, properties such as refractive index, extinction coefficient, and film thickness were very accurately determined using our OPE method. These results are compared with two previous techniques to determine properties of thin films, and the accuracy and applicable conditions for all of these methods are discussed.