5 results
Formation of ultrathin CoSi2 films using a two-step limited reaction process
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- Journal:
- Journal of Materials Research / Volume 8 / Issue 12 / December 1993
- Published online by Cambridge University Press:
- 03 March 2011, pp. 3111-3121
- Print publication:
- December 1993
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In-situ emissivity and temperature measurement during rapid thermal processing (RTP)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 653
- Print publication:
- 1992
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Investigation of an in-situ probe for phase transformations during RTP silicidation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 145
- Print publication:
- 1992
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Avoiding Dislocation Formation for B, P, and As Implants in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 235 / 1991
- Published online by Cambridge University Press:
- 28 February 2011, 173
- Print publication:
- 1991
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Influence of Phosphorus Dopant Concentration on Recrystallization of Buried Amorphous Layers in SI(100) Produced by Channeled Implants
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- Journal:
- MRS Online Proceedings Library Archive / Volume 128 / 1988
- Published online by Cambridge University Press:
- 25 February 2011, 557
- Print publication:
- 1988
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