The microstructure of NdNiO3 thin films deposited on Si (100) has been
investigated by high resolution electron microscopy. Deposition at 250 °C
and 600 °C and several annealing at high temperature under oxygen pressure
were performed. Depending on the deposition temperature and annealing
conditions, different texture and microstructure were observed. Relationships
between microstructure and transport properties are discussed. The
differences of grain boundaries are suggested to be responsible for the
difference in transport properties of the films.