6 results
Compound Sidewall Spacer Technology for Submicron Mosfet
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- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 449
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- 1992
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The Finite Size Effect on The Metal-Insulator Transition of VO2 Films Grown by MOCVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 237 / 1991
- Published online by Cambridge University Press:
- 21 February 2011, 417
- Print publication:
- 1991
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Impact of Various Polysilicon Deposition Process on Thin Gate-Oxide Properties in Submicron CMOS Technology
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- Journal:
- MRS Online Proceedings Library Archive / Volume 182 / 1990
- Published online by Cambridge University Press:
- 21 February 2011, 281
- Print publication:
- 1990
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The Effect of Window Edge Stress on Dopant Diffusion in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 76 / 1986
- Published online by Cambridge University Press:
- 25 February 2011, 277
- Print publication:
- 1986
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Effect of Heavy Doping on the Nucleation and Growth of Bulk Stacking Faults in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 36 / 1984
- Published online by Cambridge University Press:
- 21 February 2011, 231
- Print publication:
- 1984
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Diffusion of Dopants in (111) Silicon During High Temperature Heat Treatment in Nitrogen
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- Journal:
- MRS Online Proceedings Library Archive / Volume 36 / 1984
- Published online by Cambridge University Press:
- 21 February 2011, 83
- Print publication:
- 1984
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