21 results
A study on H2 plasma treatment effect on a-IGZO thin film transistor
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- Journal:
- Journal of Materials Research / Volume 27 / Issue 17 / 14 September 2012
- Published online by Cambridge University Press:
- 03 July 2012, pp. 2318-2325
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- 14 September 2012
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Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
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- Journal of Materials Research / Volume 25 / Issue 10 / October 2010
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- 31 January 2011, pp. 1898-1903
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- October 2010
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Epitaxial CoSi2 formation using an oxynitride buffer layer
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- Journal of Materials Research / Volume 24 / Issue 8 / August 2009
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- 31 January 2011, pp. 2705-2710
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- August 2009
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Plasma Enhanced Atomic Layer Deposition of ZrO2 Gate Dielectric
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- MRS Online Proceedings Library Archive / Volume 716 / 2002
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- 01 February 2011, B2.1
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- 2002
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Field emission properties of nitrogen-doped diamond-like carbon films deposited by direct metal ion beam deposition
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- MRS Online Proceedings Library Archive / Volume 697 / January 2001
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- 17 March 2011, P8.25
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- January 2001
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Atomic Layer Deposition of TiN on Si (100) and (111) Substrates
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- MRS Online Proceedings Library Archive / Volume 616 / 2000
- Published online by Cambridge University Press:
- 10 February 2011, 211
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- 2000
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Effect of TiO2 Addition on the Secondary Electron Emission and Discharge Properties of MgO Protective Layer
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- MRS Online Proceedings Library Archive / Volume 621 / 2000
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- 14 March 2011, Q5.6.1
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- 2000
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Reduction of The Phase Transition Temperature of TiSi2 on Si(111) Using a Ta Interlayer
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- MRS Online Proceedings Library Archive / Volume 564 / 1999
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- 10 February 2011, 59
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- 1999
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Suppression of the Phase Transition and Agglomeration of TiSi2 by Addition of Zr Element
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- MRS Online Proceedings Library Archive / Volume 514 / 1998
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- 10 February 2011, 225
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- 1998
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TiN Diffusion Barrier Formation by Pulsed Source Chemical Vapor Deposition method
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- MRS Online Proceedings Library Archive / Volume 514 / 1998
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- 10 February 2011, 407
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- 1998
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Comparison of Removal Efficiency of Cu Impurity on Si(100) Depending on the Cleaning Splits of (UV/O3 + HF) and (H2O2 + HF)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 477 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 253
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- 1997
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Amorphous Phase Formation of Titanium Silicide on The 4° off-Axis and on-Axis Si(100) Substrates
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- MRS Online Proceedings Library Archive / Volume 427 / 1996
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- 15 February 2011, 553
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- 1996
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Effects of UV/O3 and SC1 Steps for the HF Last Silicon Wafer Cleaning
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- MRS Online Proceedings Library Archive / Volume 386 / 1995
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- 15 February 2011, 297
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- 1995
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Phase Transition and Formation of TiSi2 Codeposited on Atomically Clean Si(111).
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- MRS Online Proceedings Library Archive / Volume 311 / 1993
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- 21 February 2011, 275
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- 1993
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Nucleation and Morphology of TiSi2 on Si
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- MRS Online Proceedings Library Archive / Volume 260 / 1992
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- 25 February 2011, 195
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- 1992
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Heteroepitaxial Growih and Characterization of Titanium Films on Alpha (6H) Silicon Carbide
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- MRS Online Proceedings Library Archive / Volume 221 / 1991
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- 25 February 2011, 99
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- 1991
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Interface Morphology, Nucleation and Island Formation of Tisi2 on Si(111).
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- MRS Online Proceedings Library Archive / Volume 181 / 1990
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- 25 February 2011, 559
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- 1990
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Thickness Dependence of Epitaxial TiSi2 on Si(111).
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- MRS Online Proceedings Library Archive / Volume 202 / 1990
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- 25 February 2011, 673
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- 1990
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Growth and Characterization of Heteroepitaxial Nickel Films on Diamond Substrates
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- MRS Online Proceedings Library Archive / Volume 202 / 1990
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- 25 February 2011, 463
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- 1990
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Epitaxial Growth and Stability of C49 TiSi2 ON Si(111).
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- MRS Online Proceedings Library Archive / Volume 198 / 1990
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- 28 February 2011, 595
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- 1990
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