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FDTD study of the effects of the doubly ionized ions on the plasma immersion ion implantation process

Published online by Cambridge University Press:  15 January 2014

M. Sharifian  and
Y. Sadeghi
M. Sharifian*
Affiliation:
Atomic & Molecular Group, Department of Physics, University of Yazd, P.O. Box: 89195-741, Yazd, Iran
Y. Sadeghi
Affiliation:
Atomic & Molecular Group, Department of Physics, University of Yazd, P.O. Box: 89195-741, Yazd, Iran
*
†Email address for correspondence: mehdi.sharifian@yazd.ac.ir
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Abstract

The plasma sheath dynamics adjacent to the cathode in the presence of electrons, ions, and doubly ionized ions have been simulated in this work. The aim of the present investigation is, therefore, to study the effect of the doubly ionized ions on the characteristics of the plasma sheath dynamics such as potential distribution, sheath length, and ions dose and velocity near the surface (cathode). It was shown that the presence of the doubly ionized ions can increase the normalized potential of all positions in sheath region, sheath length, and ion/doubly ionized ions density ratio on the target. Obtained results may be helpful for analyzing the practical results of the surface operations such as ion implantation and plasma polymerization, etc.

Type
Papers
Information
Journal of Plasma Physics , Volume 80 , Issue 2 , April 2014 , pp. 215 - 223
Copyright
Copyright © Cambridge University Press 2014 

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