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Nano/micro-mechanical and tribological characterization of Ar, C, N, and Ne ion-implanted Si

  • Zhi-Hui Xu (a1), Young-Bae Park (a2) and Xiaodong Li (a1)

Ion implantation has been widely used to improve the mechanical and tribological properties of single crystalline silicon, an essential material for the semiconductor industry. In this study, the effects of four different ion implantations, Ar, C, N, and Ne ions, on the mechanical and tribological properties of single crystal Si were investigated at both the nanoscale and the microscale. Nanoindentation and microindentation were used to measure the mechanical properties and fracture toughness of ion-implanted Si. Nano and micro scratch and wear tests were performed to study the tribological behaviors of different ion-implanted Si. The relationship between the mechanical properties and tribological behavior and the damage mechanism of scratch and wear were also discussed.

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Journal of Materials Research
  • ISSN: 0884-2914
  • EISSN: 2044-5326
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