Symposium B – In-Situ Patterning: Selective Area Deposition and Etching
Research Article
Laser-Induced Local Decomposition of Adsorbed Tungsten Fluorine Molecules for Metal Deposition on Silicon
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- 21 February 2011, 155
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Excimer Laser Induced Deposition of Tungsten from W(CO)6 and WF6
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- 21 February 2011, 161
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Direct Writing of Copper Lines from Copper Formate Precursors Using a Nd:Yag-Laser
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- 21 February 2011, 169
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Roles of Gas Phase and Surface Photolysis in Laser Chemical Vapor Deposition from Fe(CO)5
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- 21 February 2011, 175
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Photo-Oxidation of Hydrogenated Amorphous Silicon-Carbon Alloys
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- 21 February 2011, 181
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Metal Deposition with Incoherent Excimer Radiation
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- 21 February 2011, 189
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Electronic Excitation-Induced Surface Chemistry and Electron-Beam-Assisted Chemical Vapor Deposition
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- 21 February 2011, 201
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Patterning of Gaas/AIGaAs Wafers by Focused Electron-Bear Induced Chlorine Etching and Subsequent Kbe Growth
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- 21 February 2011, 211
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Deep Structures Produced in III-V Materials by Combined Focused Ion Beam Irradiation and Dry Etching
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- 21 February 2011, 217
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Maskless Formation of Tungsten Films by Ion Beam Assisted Deposition Technique
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- 21 February 2011, 223
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The Role of Adsorption and Vapor Pressure in Focused Ion Beam Induced Deposition of Carbon Films
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- 21 February 2011, 229
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Selective Chemical Vapor Deposition of Tungsten Films on Titanium—Ion—Irradiated Silicon Dioxide
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- 21 February 2011, 235
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Nanosecond Thermal Processing for Ultra-High-Speed Device Technology
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- 21 February 2011, 241
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In Situ Measurement of Pulsed Laser Indxuce Carrier Ceneraticn in Doped Silicon Films
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- 21 February 2011, 255
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Laser Processed Silicides for GaAs Hemts
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- 21 February 2011, 261
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Substrate Heating Effects in Excimer Laser Planarization of Aluminum
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- 21 February 2011, 267
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Low Temperature Interlevel SiO2 Layers by Photoinduced Processing
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- 21 February 2011, 273
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Phosphorus Doping into Silicon Using ArF Excimer Laser
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- 21 February 2011, 281
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The Interaction of Laser Generated Methyl Radicals with Cd, Te, and CdTe Surfaces
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- 21 February 2011, 289
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Holographic Pattern Etching of Silicon—Carbide by Excimer Laser
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- 21 February 2011, 295
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