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Contributors
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- By Aakash Agarwala, Linda S. Aglio, Rae M. Allain, Paul D. Allen, Houman Amirfarzan, Yasodananda Kumar Areti, Amit Asopa, Edwin G. Avery, Patricia R. Bachiller, Angela M. Bader, Rana Badr, Sibinka Bajic, David J. Baker, Sheila R. Barnett, Rena Beckerly, Lorenzo Berra, Walter Bethune, Sascha S. Beutler, Tarun Bhalla, Edward A. Bittner, Jonathan D. Bloom, Alina V. Bodas, Lina M. Bolanos-Diaz, Ruma R. Bose, Jan Boublik, John P. Broadnax, Jason C. Brookman, Meredith R. Brooks, Roland Brusseau, Ethan O. Bryson, Linda A. Bulich, Kenji Butterfield, William R. Camann, Denise M. Chan, Theresa S. Chang, Jonathan E. Charnin, Mark Chrostowski, Fred Cobey, Adam B. Collins, Mercedes A. Concepcion, Christopher W. Connor, Bronwyn Cooper, Jeffrey B. Cooper, Martha Cordoba-Amorocho, Stephen B. Corn, Darin J. Correll, Gregory J. Crosby, Lisa J. Crossley, Deborah J. Culley, Tomas Cvrk, Michael N. D'Ambra, Michael Decker, Daniel F. Dedrick, Mark Dershwitz, Francis X. Dillon, Pradeep Dinakar, Alimorad G. Djalali, D. John Doyle, Lambertus Drop, Ian F. Dunn, Theodore E. Dushane, Sunil Eappen, Thomas Edrich, Jesse M. Ehrenfeld, Jason M. Erlich, Lucinda L. Everett, Elliott S. Farber, Khaldoun Faris, Eddy M. Feliz, Massimo Ferrigno, Richard S. Field, Michael G. Fitzsimons, Hugh L. Flanagan Jr., Vladimir Formanek, Amanda A. Fox, John A. Fox, Gyorgy Frendl, Tanja S. Frey, Samuel M. Galvagno Jr., Edward R. Garcia, Jonathan D. Gates, Cosmin Gauran, Brian J. Gelfand, Simon Gelman, Alexander C. Gerhart, Peter Gerner, Omid Ghalambor, Christopher J. Gilligan, Christian D. Gonzalez, Noah E. Gordon, William B. Gormley, Thomas J. Graetz, Wendy L. Gross, Amit Gupta, James P. Hardy, Seetharaman Hariharan, Miriam Harnett, Philip M. Hartigan, Joaquim M. Havens, Bishr Haydar, Stephen O. Heard, James L. Helstrom, David L. Hepner, McCallum R. Hoyt, Robert N. Jamison, Karinne Jervis, Stephanie B. Jones, Swaminathan Karthik, Richard M. Kaufman, Shubjeet Kaur, Lee A. Kearse Jr., John C. Keel, Scott D. Kelley, Albert H. Kim, Amy L. Kim, Grace Y. Kim, Robert J. Klickovich, Robert M. Knapp, Bhavani S. Kodali, Rahul Koka, Alina Lazar, Laura H. Leduc, Stanley Leeson, Lisa R. Leffert, Scott A. LeGrand, Patricio Leyton, J. Lance Lichtor, John Lin, Alvaro A. Macias, Karan Madan, Sohail K. Mahboobi, Devi Mahendran, Christine Mai, Sayeed Malek, S. Rao Mallampati, Thomas J. Mancuso, Ramon Martin, Matthew C. Martinez, J. A. Jeevendra Martyn, Kai Matthes, Tommaso Mauri, Mary Ellen McCann, Shannon S. McKenna, Dennis J. McNicholl, Abdel-Kader Mehio, Thor C. Milland, Tonya L. K. Miller, John D. Mitchell, K. Annette Mizuguchi, Naila Moghul, David R. Moss, Ross J. Musumeci, Naveen Nathan, Ju-Mei Ng, Liem C. Nguyen, Ervant Nishanian, Martina Nowak, Ala Nozari, Michael Nurok, Arti Ori, Rafael A. Ortega, Amy J. Ortman, David Oxman, Arvind Palanisamy, Carlo Pancaro, Lisbeth Lopez Pappas, Benjamin Parish, Samuel Park, Deborah S. Pederson, Beverly K. Philip, James H. Philip, Silvia Pivi, Stephen D. Pratt, Douglas E. Raines, Stephen L. Ratcliff, James P. Rathmell, J. Taylor Reed, Elizabeth M. Rickerson, Selwyn O. Rogers Jr., Thomas M. Romanelli, William H. Rosenblatt, Carl E. Rosow, Edgar L. Ross, J. Victor Ryckman, Mônica M. Sá Rêgo, Nicholas Sadovnikoff, Warren S. Sandberg, Annette Y. Schure, B. Scott Segal, Navil F. Sethna, Swapneel K. Shah, Shaheen F. Shaikh, Fred E. Shapiro, Torin D. Shear, Prem S. Shekar, Stanton K. Shernan, Naomi Shimizu, Douglas C. Shook, Kamal K. Sikka, Pankaj K. Sikka, David A. Silver, Jeffrey H. Silverstein, Emily A. Singer, Ken Solt, Spiro G. Spanakis, Wolfgang Steudel, Matthias Stopfkuchen-Evans, Michael P. Storey, Gary R. Strichartz, Balachundhar Subramaniam, Wariya Sukhupragarn, John Summers, Shine Sun, Eswar Sundar, Sugantha Sundar, Neelakantan Sunder, Faraz Syed, Usha B. Tedrow, Nelson L. Thaemert, George P. Topulos, Lawrence C. Tsen, Richard D. Urman, Charles A. Vacanti, Francis X. Vacanti, Joshua C. Vacanti, Assia Valovska, Ivan T. Valovski, Mary Ann Vann, Susan Vassallo, Anasuya Vasudevan, Kamen V. Vlassakov, Gian Paolo Volpato, Essi M. Vulli, J. Matthias Walz, Jingping Wang, James F. Watkins, Maxwell Weinmann, Sharon L. Wetherall, Mallory Williams, Sarah H. Wiser, Zhiling Xiong, Warren M. Zapol, Jie Zhou
- Edited by Charles Vacanti, Scott Segal, Pankaj Sikka, Richard Urman
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- Book:
- Essential Clinical Anesthesia
- Published online:
- 05 January 2012
- Print publication:
- 11 July 2011, pp xv-xxviii
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The relationship between diet, the copper and sulphur content of wool, and fibre characteristics
- U. R. Kapoor, O. N. Agarwala, V. C. Pachauri, K. Nath, S. Narayan
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- Journal:
- The Journal of Agricultural Science / Volume 79 / Issue 1 / August 1972
- Published online by Cambridge University Press:
- 27 March 2009, pp. 109-114
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Thirty-six rams of Chokla breed of about 1–1½12 years of age were randomly divided into six groups and were fed for 4 months on a basal ration of Cynodon dactylon grass or its hay ad libitum. One group acted as the control, while the rations of the remaining groups were respectively supplemented with 250 g of a concentrate mixture, 250 g of lucerne hay, mg CoCl2.6H2O, 10 mg CuSO4.5H2O and 1 mg CoCl2. 6H2O plus 10 mg CuSO4. 5H2O per animal per day. The mean copper, sulphur and cobalt ingestion in the different groups respectively ranged from.1 to 9·7, 475 to 2030 and 0·10 to 0·53 mg per animal per day. The copper, sulphur, fibre diameter, staple length, medullation percentage, crimp per cm and staining grade were not significantly (P > 0·05) affected by the different dietary treatments. The wool copper was strongly correlated with wool sulphur (r = + 0·79) and both were inversely correlated with fibre diameter and medullation percentage. Wool sulphur, but not wool copper, was inversely correlated with staple length. Wool copper, but not wool sulphur, was inversely correlated with the staining grade of canary coloured wool. Staining grade was inversely correlated with fibre diameter as well as crimps per cm. The results suggest that copper plays an intrinsic role in the marshalling of the sulphur component of wool and in the synthetic mechanism of the wool fibre. A suggestion has been made that copper may be playing a biochemical part in the physiological processes causing canary coloration in Indian wools.
Mechanical and structural characterization of uniaxially cold-pressed Fe2Mo powders
- R. Morales, S. Seetharaman, V. Agarwala
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- Journal:
- Journal of Materials Research / Volume 17 / Issue 8 / August 2002
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1954-1959
- Print publication:
- August 2002
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In this work, Fe2Mo intermetallic powder, produced by H2 gas reduction of Fe2MoO4 was characterized by techniques like x-ray diffraction (XRD) and transmission electron microscopy (TEM). The TEM studies confirmed the presence of nano- and microcrystalline grains of Fe2Mo. The above powders when compressed uniaxially showed a logarithmic relation with “relative density”, δr, of the compacts. The multiple compaction mechanisms were analyzed by Kawakita's and Balshin's models. Vickers hardness number, VHN, was found to increase linearly with δr of the compacts. The hardness of Fe2Mo intermetallic when δr = 1 was estimated as 343 VHN. Using Tabor's analysis, the yield strength of Fe2Mo was found to be about 1100 MPa. This value was further confirmed from the details of relative broadening (112) Bragg peak of Fe2Mo obtained from XRD analyses of Fe2Mo at different compaction pressures.
Configured Semiconductor/Insulator Coatings for Corrosion Prevention
- F. C. Jain, J. J. Rosato, K. S. Kalonia, V. S. Agarwala
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- Journal:
- MRS Online Proceedings Library Archive / Volume 125 / 1988
- Published online by Cambridge University Press:
- 21 February 2011, 329
- Print publication:
- 1988
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Semiconductor and insulator coatings, appropriately configured in Metal-Semiconductor (MS) and Metal-Insulator (≈20–100Å)-Semiconductor (MIS) structural formats, are shown to result in the formation of a built-in active electronic barrier on metal surfaces. This interfacial electronic barrier impedes the transfer of electrons from the metal to oxidizing species present at the metal surface, thereby providing protection against corrosion. The effectiveness of the electronic barrier concept has been confirmed using weight-loss, and cathodic and anodic polarization measurements on aluminum samples coated with indium tin oxide ITO (semiconductor) and SiO2 (thin oxide/insulator) films. In particular, Al-ITO, Al-ITO-Si3N4, Al-SiO2-ITO, and Al-SiO2-ITO-Si3N4 structures were fabricated and tested in a 1% NaCl, pH-2 solution. The films were grown using chemical vapor deposition (CVD) and spray techniques to ensure high quality and reproducibility. Aluminum samples tested included commercial purity, high purity (polycrystalline and single crystalline), and alloy (7075-T6). The MS and MIS configurations were found to provide superior corrosion protection as compared to conventional insulating films (e.g., Al-Si3N4). The active electronic barrier approach is a generic methodology to inhibit corrosion, and it can be realized using other semiconductor/insulator combinations including semiconducting polymer coatings.