10 results
Utilizing Scanning Probe Microscopy to Investigate Preferential Conductive Paths through Polycrystalline BaTiO3Dielectric Layer of MLCCs
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- Journal:
- Microscopy and Microanalysis / Volume 22 / Issue S3 / July 2016
- Published online by Cambridge University Press:
- 25 July 2016, pp. 390-391
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- July 2016
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Pioneering Application of Corona Charge-Kelvin Probe Metrology to Noncontact Characterization of In0.53 Ga0.47 As/Al2O3/HfO2 Stack
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1691 / 2014
- Published online by Cambridge University Press:
- 24 July 2014, mrss14-1691-bb05-02
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- 2014
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Hafnia surface and high-k gate stacks
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1155 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1155-C11-02
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- 2009
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Characterization of Ultra-Thin Hf-based Alternative Dielectric Layers for Si CMOS by Z-contrast Imaging and Electron Energy-Loss Spectroscopy in STEM
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- Journal:
- Microscopy and Microanalysis / Volume 10 / Issue S02 / August 2004
- Published online by Cambridge University Press:
- 01 August 2004, pp. 322-323
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- August 2004
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Advanced Characterization of Novel Gate Stacks for Si CMOS by Scanning Transmission Electron Microscopy
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- Journal:
- Microscopy and Microanalysis / Volume 10 / Issue S02 / August 2004
- Published online by Cambridge University Press:
- 01 August 2004, pp. 290-291
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- August 2004
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Physical and Electrical Characterization of Hafnium Silicate Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N8.3/T6.3
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- 2002
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Physical and Electrical Characterization of Hafnium Silicate Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 747 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, T6.3/N8.3
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- 2002
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Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K2.1
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- 2001
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Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 568 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 283
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- 1999
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Electroplated Cu Recrystallization in Damascene Structures at Elevated Temperatures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 564 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 429
- Print publication:
- 1999
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