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7 results

  • The neuropathological study of myelin oligodendrocyte glycoprotein in the temporal lobe of schizophrenia patients

  • Tomoyasu Marui, Youta Torii, Shuji Iritani, Hirotaka Sekiguchi, Chikako Habuchi, Hiroshige Fujishiro, Kenichi Oshima, Kazuhiro Niizato, Shotaro Hayashida, Katsuhisa Masaki, Junichi Kira, Norio Ozaki
  • Journal:
    Acta Neuropsychiatrica / Volume 30 / Issue 4 / August 2018
    Published online by Cambridge University Press:
    22 March 2018, pp. 232-240
  • Objective

    Recent studies based on the neuroimaging analysis, genomic analysis and transcriptome analysis of the postmortem brain suggest that the pathogenesis of schizophrenia is related to myelin-oligodendrocyte abnormalities. However, no serious neuropathological investigation of this protein in the schizophrenic brain has yet been performed. In this study, to confirm the change in neuropathological findings due to the pathogenesis of this disease, we observed the expression of myelin-oligodendrocyte directly in the brain tissue of schizophrenia patients.

    Methods

    Myelin oligodendrocyte glycoprotein (MOG) was evaluated in the cortex of the superior temporal gyrus (STG) and the hippocampus in 10 schizophrenic and nine age- and sex-matched normal control postmortem brains.

    Results

    The expression of MOG was significantly lower in the middle layer of the neocortex of the STG and stratum lucidum of CA3 in the hippocampus in the long-term schizophrenic brains (patients with ≥30 years of illness duration) than in the age-matched controls. Furthermore, the thickness of MOG-positive fibre-like structures was significantly lower in both regions of the long-term schizophrenic brains than in the age-matched controls.

    Conclusion

    These findings suggest that a long duration of illness has a marked effect on the expression of MOG in these regions, and that myelin-oligodendrocyte abnormalities in these regions may be related to the progressive pathophysiology of schizophrenia.

  • A Novel MO Precursor for Metal Tantalum and Tantalum Nitride Film

  • Kenichi Sekimoto, Taishi Furukawa, Noriaki Oshima, Ken-ichi Tada, Tetsu Yamakawa
  • Journal:
    MRS Online Proceedings Library Archive / Volume 914 / 2006
    Published online by Cambridge University Press:
    01 February 2011, 0914-F09-03
    Print publication:
    2006

  • A novel tantalum precursor, bis(ethylcyclopentadienyl)hydridocarbonyltantalum (Ta(EtCp)2(CO)H EtCp:ethylcyclopentadienyl), for chemical vapor deposition (CVD) and atomic layer deposition (ALD) was synthesized. The molecular structure of this precursor was determined by 1H and 13C NMR, IR, ICP-AES and elemental analysis. This precursor is liquid at room temperature, and its vapor pressure and decomposition temperature indicates that this precursor is suitable for CVD and ALD process.

    The composition analysis of metal tantalum films deposited by thermal CVD revealed that the concentration of carbon was larger than tantalum. On the other hand, an argon plasma CVD technique reduced the carbon concentration drastically.