11 results
8 - What motivates street-level bureaucrats to implement the reforms of elected politicians?
- Edited by Benjamin Ewert, Hochschule Fulda – University of Applied Sciences, Germany, Kathrin Loer, Hochschule Osnabrück, Germany, Eva Thomann, Universität Konstanz, Germany
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- Book:
- Beyond Nudge
- Published by:
- Bristol University Press
- Published online:
- 28 March 2024
- Print publication:
- 15 December 2023, pp 149-171
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Summary
Bureaucratic organisations are often expected to run according to rules (Crozier, 1964; Weber, 1974). Political science research has offered optimistic views regarding political control of the bureaucracy by focusing on how to control bureaucrats rather than on whether to control them. An extensive literature on political control of the bureaucracy discusses mechanisms of delegation and accountability from inside and outside the bureaucracy and highlights the role of principals rather than that of agents (for example, McCubbins and Schwartz, 1984; Epstein and O’Halloran, 1999; Huber and Shipan, 2002; Lee, 2020). However, what actually happens on the agent side of the principal–agent relationship, particularly on the front line, seems to deviate from the political control arguments.
In reality, public employees on the front line are in a position where they intrinsically exert discretion in policy implementation. Lipsky’s (1980/ 2010) seminal work suggests that the discretion granted to street-level bureaucrats (SLBs) and their relative autonomy from principals create room to be filled by their own decisions which, in turn, are influenced by street-level factors. Although elected politicians do play a role in changing agency policies and influencing policy outcomes (Scholz and Wood, 1998; Lewis, 2008; Lee and Park, 2020), public administrative research has provided limited evidence of political influences on the actions of SLBs (Brehm and Gates, 1997; Riccucci et al, 2004; Riccucci, 2005). In a word, since Lipsky’s observation of SLBs’ behaviour, this view has been well accepted by subsequent research.
The main question is, then, what affects SLBs’ decisions? An extensive literature on SLBs’ implementation of policy has examined a variety of factors, ranging from bureaucrats’ attitudes and knowledge concerning their tasks (Sandfort, 2000; Meyers and Vorsanger, 2003), the characteristics of the implementing organisations (Lynn et al, 2001; Hill and Lynn, 2004; Brodkin, 2007; 2011), to contextual factors related to workloads and external pressures (May and Winter, 2009). Regarding political factors, although their influence over SLBs’ implementation is found to be relatively muted, it is still important to understand why there is variation in the extent to which SLBs respond to their elected politicians across individuals in a given institutional context.
Circling the Wagons: How Perceived Injustice Increases Female Bureaucrats’ Support for Female Political Leaders
- Don S. Lee, Paul Schuler, Soonae Park
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- Journal:
- Journal of East Asian Studies / Volume 23 / Issue 2 / July 2023
- Published online by Cambridge University Press:
- 24 February 2023, pp. 333-345
- Print publication:
- July 2023
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Does female bureaucratic support for female political leaders change over time? Existing research focuses on factors that vary across countries. Little work examines how contingent events within a context impact gender-based solidarity. Drawing on collective identity theory, we argue that high-profile incidents of perceived gender-based injustice against a female president could increase female bureaucrats’ support for the leader. To explore this, we leverage a unique setting of a female president's impeachment in South Korea to assess the relationship between gender and bureaucrats’ support. Examining support for President Park before and after the impeachment, we find that her impeachment has a gendered impact on support, with female bureaucrats’ support increasing and male bureaucratic support remaining unchanged. Furthermore, mediation analysis provides suggestive evidence that the result operates through a heightened sense of injustice. Our findings suggest that support for female political leaders varies not only across countries, but also shifts within governments.
PORTFOLIO ALLOCATION AS THE PRESIDENT'S CALCULATIONS: LOYALTY, COPARTISANSHIP, AND POLITICAL CONTEXT IN SOUTH KOREA
- Don S. Lee
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- Journal:
- Journal of East Asian Studies / Volume 18 / Issue 3 / November 2018
- Published online by Cambridge University Press:
- 01 June 2018, pp. 345-365
- Print publication:
- November 2018
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How do the president's calculations in achieving policy goals shape the allocation of cabinet portfolios? Despite the growing literature on presidential cabinet appointments, this question has barely been addressed. I argue that cabinet appointments are strongly affected not only by presidential incentives to effectively deliver their key policy commitments but also by their interest in having their administration maintain strong political leverage. Through an analysis of portfolio allocations in South Korea after democratization, I demonstrate that the posts wherein ministers can influence the government's overall reputation typically go to nonpartisan professionals ideologically aligned with presidents, while the posts wherein ministers can exert legislators' influence generally go to senior copartisans. My findings highlight a critical difference in presidential portfolio allocation from parliamentary democracies, where key posts tend to be reserved for senior parliamentarians from the ruling party.
Periventricular white matter hyperintensities and the risk of dementia: a CREDOS study
- Sangha Kim, Seong Hye Choi, Young Min Lee, Min Ji Kim, Young Don Kim, Jin Young Kim, Jin Hong Park, Woojae Myung, Hae Ri Na, Hyun Jeong Han, Yong S. Shim, Jong Hun Kim, Soo Jin Yoon, Sang Yun Kim, Doh Kwan Kim
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- Journal:
- International Psychogeriatrics / Volume 27 / Issue 12 / December 2015
- Published online by Cambridge University Press:
- 27 July 2015, pp. 2069-2077
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Background:
Cerebral white matter hyperintensities (WMH) are prevalent incident findings on brain MRI scans among elderly people and have been consistently implicated in cognitive dysfunction. However, differential roles of WMH by region in cognitive function are still unclear. The aim of this study was to ascertain the differential role of regional WMH in predicting progression from mild cognitive impairment (MCI) to different subtypes of dementia.
Methods:Participants were recruited from the Clinical Research Center for Dementia of South Korea (CREDOS) study. A total of 622 participants with MCI diagnoses at baseline and follow-up evaluations were included for the analysis. Initial MRI scans were rated for WMH on a visual rating scale developed for the CREDOS. Differential effects of regional WMH in predicting incident dementia were evaluated using the Cox proportional hazards model.
Results:Of the 622 participants with MCI at baseline, 139 patients (22.3%) converted to all-cause dementia over a median of 14.3 (range 6.0–36.5) months. Severe periventricular WMH (PWMH) predicted incident all-cause dementia (Hazard ratio (HR) 2.22; 95% confidence interval (CI) 1.43–3.43) and Alzheimer's disease (AD) (HR 1.86; 95% CI 1.12–3.07). Subcortical vascular dementia (SVD) was predicted by both PWMH (HR 16.14; 95% CI 1.97–132.06) and DWMH (HR 8.77; 95% CI 1.77–43.49) in more severe form (≥ 10 mm).
Conclusions:WMH differentially predict dementia by region and severity. Our findings suggest that PWMH may play an independent role in the pathogenesis of dementia, especially in AD.
Contributors
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- By Mitchell Aboulafia, Frederick Adams, Marilyn McCord Adams, Robert M. Adams, Laird Addis, James W. Allard, David Allison, William P. Alston, Karl Ameriks, C. Anthony Anderson, David Leech Anderson, Lanier Anderson, Roger Ariew, David Armstrong, Denis G. Arnold, E. J. Ashworth, Margaret Atherton, Robin Attfield, Bruce Aune, Edward Wilson Averill, Jody Azzouni, Kent Bach, Andrew Bailey, Lynne Rudder Baker, Thomas R. Baldwin, Jon Barwise, George Bealer, William Bechtel, Lawrence C. Becker, Mark A. Bedau, Ernst Behler, José A. Benardete, Ermanno Bencivenga, Jan Berg, Michael Bergmann, Robert L. Bernasconi, Sven Bernecker, Bernard Berofsky, Rod Bertolet, Charles J. Beyer, Christian Beyer, Joseph Bien, Joseph Bien, Peg Birmingham, Ivan Boh, James Bohman, Daniel Bonevac, Laurence BonJour, William J. Bouwsma, Raymond D. Bradley, Myles Brand, Richard B. Brandt, Michael E. Bratman, Stephen E. Braude, Daniel Breazeale, Angela Breitenbach, Jason Bridges, David O. Brink, Gordon G. Brittan, Justin Broackes, Dan W. Brock, Aaron Bronfman, Jeffrey E. Brower, Bartosz Brozek, Anthony Brueckner, Jeffrey Bub, Lara Buchak, Otavio Bueno, Ann E. Bumpus, Robert W. Burch, John Burgess, Arthur W. Burks, Panayot Butchvarov, Robert E. Butts, Marina Bykova, Patrick Byrne, David Carr, Noël Carroll, Edward S. Casey, Victor Caston, Victor Caston, Albert Casullo, Robert L. Causey, Alan K. L. Chan, Ruth Chang, Deen K. Chatterjee, Andrew Chignell, Roderick M. Chisholm, Kelly J. Clark, E. J. Coffman, Robin Collins, Brian P. Copenhaver, John Corcoran, John Cottingham, Roger Crisp, Frederick J. Crosson, Antonio S. Cua, Phillip D. Cummins, Martin Curd, Adam Cureton, Andrew Cutrofello, Stephen Darwall, Paul Sheldon Davies, Wayne A. Davis, Timothy Joseph Day, Claudio de Almeida, Mario De Caro, Mario De Caro, John Deigh, C. F. Delaney, Daniel C. Dennett, Michael R. DePaul, Michael Detlefsen, Daniel Trent Devereux, Philip E. Devine, John M. Dillon, Martin C. Dillon, Robert DiSalle, Mary Domski, Alan Donagan, Paul Draper, Fred Dretske, Mircea Dumitru, Wilhelm Dupré, Gerald Dworkin, John Earman, Ellery Eells, Catherine Z. Elgin, Berent Enç, Ronald P. Endicott, Edward Erwin, John Etchemendy, C. Stephen Evans, Susan L. Feagin, Solomon Feferman, Richard Feldman, Arthur Fine, Maurice A. Finocchiaro, William FitzPatrick, Richard E. Flathman, Gvozden Flego, Richard Foley, Graeme Forbes, Rainer Forst, Malcolm R. Forster, Daniel Fouke, Patrick Francken, Samuel Freeman, Elizabeth Fricker, Miranda Fricker, Michael Friedman, Michael Fuerstein, Richard A. Fumerton, Alan Gabbey, Pieranna Garavaso, Daniel Garber, Jorge L. A. Garcia, Robert K. Garcia, Don Garrett, Philip Gasper, Gerald Gaus, Berys Gaut, Bernard Gert, Roger F. Gibson, Cody Gilmore, Carl Ginet, Alan H. Goldman, Alvin I. Goldman, Alfonso Gömez-Lobo, Lenn E. Goodman, Robert M. Gordon, Stefan Gosepath, Jorge J. E. Gracia, Daniel W. Graham, George A. Graham, Peter J. Graham, Richard E. Grandy, I. Grattan-Guinness, John Greco, Philip T. Grier, Nicholas Griffin, Nicholas Griffin, David A. Griffiths, Paul J. Griffiths, Stephen R. Grimm, Charles L. Griswold, Charles B. Guignon, Pete A. Y. Gunter, Dimitri Gutas, Gary Gutting, Paul Guyer, Kwame Gyekye, Oscar A. Haac, Raul Hakli, Raul Hakli, Michael Hallett, Edward C. Halper, Jean Hampton, R. James Hankinson, K. R. Hanley, Russell Hardin, Robert M. Harnish, William Harper, David Harrah, Kevin Hart, Ali Hasan, William Hasker, John Haugeland, Roger Hausheer, William Heald, Peter Heath, Richard Heck, John F. Heil, Vincent F. Hendricks, Stephen Hetherington, Francis Heylighen, Kathleen Marie Higgins, Risto Hilpinen, Harold T. Hodes, Joshua Hoffman, Alan Holland, Robert L. Holmes, Richard Holton, Brad W. Hooker, Terence E. Horgan, Tamara Horowitz, Paul Horwich, Vittorio Hösle, Paul Hoβfeld, Daniel Howard-Snyder, Frances Howard-Snyder, Anne Hudson, Deal W. Hudson, Carl A. Huffman, David L. Hull, Patricia Huntington, Thomas Hurka, Paul Hurley, Rosalind Hursthouse, Guillermo Hurtado, Ronald E. Hustwit, Sarah Hutton, Jonathan Jenkins Ichikawa, Harry A. Ide, David Ingram, Philip J. Ivanhoe, Alfred L. Ivry, Frank Jackson, Dale Jacquette, Joseph Jedwab, Richard Jeffrey, David Alan Johnson, Edward Johnson, Mark D. Jordan, Richard Joyce, Hwa Yol Jung, Robert Hillary Kane, Tomis Kapitan, Jacquelyn Ann K. Kegley, James A. Keller, Ralph Kennedy, Sergei Khoruzhii, Jaegwon Kim, Yersu Kim, Nathan L. King, Patricia Kitcher, Peter D. Klein, E. D. Klemke, Virginia Klenk, George L. Kline, Christian Klotz, Simo Knuuttila, Joseph J. Kockelmans, Konstantin Kolenda, Sebastian Tomasz Kołodziejczyk, Isaac Kramnick, Richard Kraut, Fred Kroon, Manfred Kuehn, Steven T. Kuhn, Henry E. Kyburg, John Lachs, Jennifer Lackey, Stephen E. Lahey, Andrea Lavazza, Thomas H. Leahey, Joo Heung Lee, Keith Lehrer, Dorothy Leland, Noah M. Lemos, Ernest LePore, Sarah-Jane Leslie, Isaac Levi, Andrew Levine, Alan E. Lewis, Daniel E. Little, Shu-hsien Liu, Shu-hsien Liu, Alan K. L. Chan, Brian Loar, Lawrence B. Lombard, John Longeway, Dominic McIver Lopes, Michael J. Loux, E. J. Lowe, Steven Luper, Eugene C. Luschei, William G. Lycan, David Lyons, David Macarthur, Danielle Macbeth, Scott MacDonald, Jacob L. Mackey, Louis H. Mackey, Penelope Mackie, Edward H. Madden, Penelope Maddy, G. B. Madison, Bernd Magnus, Pekka Mäkelä, Rudolf A. Makkreel, David Manley, William E. Mann (W.E.M.), Vladimir Marchenkov, Peter Markie, Jean-Pierre Marquis, Ausonio Marras, Mike W. Martin, A. P. Martinich, William L. McBride, David McCabe, Storrs McCall, Hugh J. McCann, Robert N. McCauley, John J. McDermott, Sarah McGrath, Ralph McInerny, Daniel J. McKaughan, Thomas McKay, Michael McKinsey, Brian P. McLaughlin, Ernan McMullin, Anthonie Meijers, Jack W. Meiland, William Jason Melanson, Alfred R. Mele, Joseph R. Mendola, Christopher Menzel, Michael J. Meyer, Christian B. Miller, David W. Miller, Peter Millican, Robert N. Minor, Phillip Mitsis, James A. Montmarquet, Michael S. Moore, Tim Moore, Benjamin Morison, Donald R. Morrison, Stephen J. Morse, Paul K. Moser, Alexander P. D. Mourelatos, Ian Mueller, James Bernard Murphy, Mark C. Murphy, Steven Nadler, Jan Narveson, Alan Nelson, Jerome Neu, Samuel Newlands, Kai Nielsen, Ilkka Niiniluoto, Carlos G. Noreña, Calvin G. Normore, David Fate Norton, Nikolaj Nottelmann, Donald Nute, David S. Oderberg, Steve Odin, Michael O’Rourke, Willard G. Oxtoby, Heinz Paetzold, George S. Pappas, Anthony J. Parel, Lydia Patton, R. P. Peerenboom, Francis Jeffry Pelletier, Adriaan T. Peperzak, Derk Pereboom, Jaroslav Peregrin, Glen Pettigrove, Philip Pettit, Edmund L. Pincoffs, Andrew Pinsent, Robert B. Pippin, Alvin Plantinga, Louis P. Pojman, Richard H. Popkin, John F. Post, Carl J. Posy, William J. Prior, Richard Purtill, Michael Quante, Philip L. Quinn, Philip L. Quinn, Elizabeth S. Radcliffe, Diana Raffman, Gerard Raulet, Stephen L. Read, Andrews Reath, Andrew Reisner, Nicholas Rescher, Henry S. Richardson, Robert C. Richardson, Thomas Ricketts, Wayne D. Riggs, Mark Roberts, Robert C. Roberts, Luke Robinson, Alexander Rosenberg, Gary Rosenkranz, Bernice Glatzer Rosenthal, Adina L. Roskies, William L. Rowe, T. M. Rudavsky, Michael Ruse, Bruce Russell, Lilly-Marlene Russow, Dan Ryder, R. M. Sainsbury, Joseph Salerno, Nathan Salmon, Wesley C. Salmon, Constantine Sandis, David H. Sanford, Marco Santambrogio, David Sapire, Ruth A. Saunders, Geoffrey Sayre-McCord, Charles Sayward, James P. Scanlan, Richard Schacht, Tamar Schapiro, Frederick F. Schmitt, Jerome B. Schneewind, Calvin O. Schrag, Alan D. Schrift, George F. Schumm, Jean-Loup Seban, David N. Sedley, Kenneth Seeskin, Krister Segerberg, Charlene Haddock Seigfried, Dennis M. Senchuk, James F. Sennett, William Lad Sessions, Stewart Shapiro, Tommie Shelby, Donald W. Sherburne, Christopher Shields, Roger A. Shiner, Sydney Shoemaker, Robert K. Shope, Kwong-loi Shun, Wilfried Sieg, A. John Simmons, Robert L. Simon, Marcus G. Singer, Georgette Sinkler, Walter Sinnott-Armstrong, Matti T. Sintonen, Lawrence Sklar, Brian Skyrms, Robert C. Sleigh, Michael Anthony Slote, Hans Sluga, Barry Smith, Michael Smith, Robin Smith, Robert Sokolowski, Robert C. Solomon, Marta Soniewicka, Philip Soper, Ernest Sosa, Nicholas Southwood, Paul Vincent Spade, T. L. S. Sprigge, Eric O. Springsted, George J. Stack, Rebecca Stangl, Jason Stanley, Florian Steinberger, Sören Stenlund, Christopher Stephens, James P. Sterba, Josef Stern, Matthias Steup, M. A. Stewart, Leopold Stubenberg, Edith Dudley Sulla, Frederick Suppe, Jere Paul Surber, David George Sussman, Sigrún Svavarsdóttir, Zeno G. Swijtink, Richard Swinburne, Charles C. Taliaferro, Robert B. Talisse, John Tasioulas, Paul Teller, Larry S. Temkin, Mark Textor, H. S. Thayer, Peter Thielke, Alan Thomas, Amie L. Thomasson, Katherine Thomson-Jones, Joshua C. Thurow, Vzalerie Tiberius, Terrence N. Tice, Paul Tidman, Mark C. Timmons, William Tolhurst, James E. Tomberlin, Rosemarie Tong, Lawrence Torcello, Kelly Trogdon, J. D. Trout, Robert E. Tully, Raimo Tuomela, John Turri, Martin M. Tweedale, Thomas Uebel, Jennifer Uleman, James Van Cleve, Harry van der Linden, Peter van Inwagen, Bryan W. Van Norden, René van Woudenberg, Donald Phillip Verene, Samantha Vice, Thomas Vinci, Donald Wayne Viney, Barbara Von Eckardt, Peter B. M. Vranas, Steven J. Wagner, William J. Wainwright, Paul E. Walker, Robert E. Wall, Craig Walton, Douglas Walton, Eric Watkins, Richard A. Watson, Michael V. Wedin, Rudolph H. Weingartner, Paul Weirich, Paul J. Weithman, Carl Wellman, Howard Wettstein, Samuel C. Wheeler, Stephen A. White, Jennifer Whiting, Edward R. Wierenga, Michael Williams, Fred Wilson, W. Kent Wilson, Kenneth P. Winkler, John F. Wippel, Jan Woleński, Allan B. Wolter, Nicholas P. Wolterstorff, Rega Wood, W. Jay Wood, Paul Woodruff, Alison Wylie, Gideon Yaffe, Takashi Yagisawa, Yutaka Yamamoto, Keith E. Yandell, Xiaomei Yang, Dean Zimmerman, Günter Zoller, Catherine Zuckert, Michael Zuckert, Jack A. Zupko (J.A.Z.)
- Edited by Robert Audi, University of Notre Dame, Indiana
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- Book:
- The Cambridge Dictionary of Philosophy
- Published online:
- 05 August 2015
- Print publication:
- 27 April 2015, pp ix-xxx
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- By Gregory S. Aldrete, Andreas Bendlin, Wim Broekaert, Christer Bruun, Elisha Ann Dumser, Catharine Edwards, Paul Erdkamp, Shawn Graham, Alexandre Grandazzi, Cameron Hawkins, Elisabeth Herrmann-Otto, Benjamin Kelly, Ray Laurence, A. D. Lee, Jinyu Liu, J. Bert Lott, Thomas A. J. McGinn, Michael MacKinnon, R. Don Miller, Claudia Moatti, Neville Morley, Nicholas Purcell, Beryl Rawson, Ingrid Rowland, Leonard V. Rutgers, Michele Renee Salzman, Walter Scheidel, Glenn R. Storey, Steven L. Tuck, Robert Witcher, Adam Ziolkowski, Arjan Zuiderhoek
- Edited by Paul Erdkamp, Vrije Universiteit Brussel
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- Book:
- The Cambridge Companion to Ancient Rome
- Published online:
- 05 September 2013
- Print publication:
- 29 August 2013, pp xiv-xix
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Structural Properties of CdTe Thin Films for Solar Cell Applications Deposited on Flexible Foil Substrates
- Vasilios Palekis, Deidra Ranel Hodges, Don L Morel, Lee Stefanakos, Chris S Ferekides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1165 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1165-M08-26
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- 2009
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Cadmium telluride (CdTe) is a leading thin film photovoltaic (PV) material due to its near ideal band gap of 1.45 eV and its high optical absorption coefficient. The typical CdTe thin film solar cell is of the superstrate configuration where a window layer (CdS), the absorber (CdTe), and a back contact are deposited onto a glass slide coated with a transparent electrode. Substrate CdTe solar cells where the above listed films are deposited in reverse order are not common. In this study, the growth of CdTe thin films deposited on foil substrates by the close-spaced sublimation (CSS) has been investigated for the purpose of fabricating substrate based CdTe solar cells. The CdTe films were deposited at substrate temperatures (TSUB) in the range of 300 to 600°C, and source temperatures (TSRC) in the 600 to 650°C range. The effect of the substrate-source temperature variations on the growth rate, film structure and morphology were studied using XRD and SEM. It was found that for low substrate temperature and as the growth rate increases, grain size was the same but the films appeared to be more uniform and more densely packed with less or no pinholes. The growth rate increased as the source temperature increased. The substrate temperature clearly influences the grain growth and the preferred orientation. As the substrate temperature increased the growth rate decreased and the grain size varied from 2 to 6 μm. XRD analysis showed that with the increase in substrate temperature film orientation changes from preferential along the (111) direction to a mix of (111) (220) and (311).
Impact of Low k Dielectrics on Electromigration Reliability for Cu Interconnects
- Paul S. Ho, Ki-Don Lee, Ennis T. Ogawa, Sean Yoon, Xia Lu
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E1.6
- Print publication:
- 2003
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Multi-link statistical test structures were used to study the effect of low k dielectrics on EM reliability of Cu interconnects. Experiments were performed on dual-damascene Cu interconnects integrated with oxide, CVD low k, porous MSQ, and organic polymer ILD. The EM activation energy for Cu structures was found to be between 0.8 and 1.0 eV, indicating mass transport is dominated by diffusion at the Cu/SiNx cap-layer interface, independent of ILD. Compared with oxide, the decrease in lifetime and (jL)c observed for low-k structures can be attributed to less dielectric confinement in the low k structures. An effective modulus B obtained by finite element analysis was used to account for the dielectric confinement effect on EM. For all the ILDs studied, (jL)c showed no temperature dependence.
Electromigration Study of Cu Dual-damascene Interconnects with a CVD MSQ Low k Dielectric
- Xia Lu, Ki-Don Lee, Sean Yoon, Hideki Matsuhashi, Michael Lu, Kai Zhang, Paul S. Ho
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E1.9
- Print publication:
- 2003
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Electromigration reliability in Cu dual-damascene interconnects with a CVD MSQ low k dielectric was investigated. Statistical studies were carried out using the critical length (LC) test structures containing multi-link line/via elements with varying line lengths. EM lifetime characteristics, critical current density-length product (jL)c, and failure mechanisms were discussed and compared with Cu/oxide structures. Our results suggested that the diffusion at the cap layer interface was the dominant mechanism for EM mass transport. The confinement effect, in terms of an effective modulus B, can be used to account for the shorter EM lifetime and smaller critical current density-length product (jL)c observed for Cu/CVD MSQ low k interconnects. Failure analysis by FIB confirmed the presence of multiple failure modes including voiding at the via bottom, Cu extrusion and delamination at Cu/cap layer interface.
Electromigration in Submicron Dual-damascene Cu/low-k Interconnects
- Ki-Don Lee, Xia Lu, Ennis T. Ogawa, Hideki Matsuhashi, Volker A. Blaschke, Rod Augur, Paul S. Ho
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B12.9
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- 2002
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Electromigration (EM) lifetime characteristics and failure mechanism were investigated for Cu/porous-low-k interconnects and compared to Cu/oxide. The porous low-k dielectric was JSR LKD-5109TM, an MSQ-based spin-on organosilicate material with k = 2.2. The activation energies for EM failure were found to be 0.9 - 1.0 eV for the porous MSQ and 0.8 eV for oxide while the current density exponents for both materials were found to be similar, 1.2 - 1.3. This range of activation energies are commonly associated with mass transport at the Cu/cap-layer interface and suggest a similar mass transport mechanism; interfacial diffusion. Porous MSQ structures showed the same distinct failure morphology as observed in other Cu/low-k interconnects: voiding at the cathode and lateral Cu extrusion at the anode under the cap layer, which seems to be related to the thermo-mechanical properties of Cu/low-k interconnects. The shorter lifetime characteristics of Cu/low-k interconnects comparing to Cu/oxide can be attributed to a smaller back stress, due to less thermomechanical confinement. Results of this study indicate that thermo-mechanical properties of low-k interconnects are important parameters in controlling EM reliability of Cu/low-k interconnects.
Electromigration Reliability of Dual-Damascene Cu/Oxide Interconnects
- Ennis T. Ogawa, Volker A. Blaschke, Alex Bierwag, Ki-Don Lee, Hideki Matsuhashi, David Griffiths, Anup Ramamurthi, Patrick R. Justison, Robert H. Havemann, Paul S. Ho
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D2.3.1
- Print publication:
- 2000
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An electromigration study has determined the lifetime characteristics and failure mode of dual-damascene Cu/oxide interconnects at temperatures ranging between 200 and 325 °C at a current density of 1.0 MA/cm2. A novel test structure design is used which incorporates a repeated chain of “Blech-type” line elements. The large interconnect ensemble permits a statistical approach to addressing interconnect reliability issues using typical failure analysis tools such as focused ion beam imaging. The larger sample size of the test structure thus enables efficient identification of “early failure” or extrinsic modes of interconnect failure associated with process development. The analysis so far indicates that two major damage modes are observable: (1) via-voiding and (2) voiding within the damascene trench.