Skip to main content Accessibility help
×

Symposium R – Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics

M.L. Green, T. Hattori, H.R. Huff, G. Lucovsky, C.A. Richter
Volume 567 - 1999

Page 4 of 5


Research Article


Page 4 of 5