Physics of Radio-Frequency Plasmas

Pascal Chabert; Nicholas Braithwaite

doi:10.1017/CBO9780511974342

Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

"Chabert and Braithwaite have produced an excellent guide to the diversity of RF powered plasmas, as used for many technological processes. The value of combining experiment and theory is well demonstrated. They have given explanations of plasma behavior that will suffice for many readers’ purposes but that also provide a clear introduction to more difficult plasma conditions as the subject develops further complexities."
John I.B. Wilson in Contemporary Physics

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Physics of Radio-Frequency Plasmas

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Contents

Frontmatter
pp i-iv

Contents
pp v-vi

Acknowledgements
pp vii-viii

1 - Introduction
pp 1-17

2 - Plasma dynamics and equilibrium
pp 18-58

3 - Bounded plasma
pp 59-95

4 - Radio-frequency sheaths
pp 96-130

5 - Single-frequency capacitively coupled plasmas
pp 131-175

6 - Multi-frequency capacitively coupled plasmas
pp 176-218

7 - Inductively coupled plasmas
pp 219-259

8 - Helicon plasmas
pp 260-286

9 - Real plasmas
pp 287-317

10 - Electrical measurements
pp 318-367

Appendix: Solutions to exercises
pp 368-374

References
pp 375-382

Index
pp 383-385

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