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Development of a High Sensitivity TXRF with a Novel Monochromator Having Three Selectable Crystals

Published online by Cambridge University Press:  06 March 2019

T. Yamada ,
T. Shoji ,
M. Funabashi ,
T. Utaka ,
T. Arai  and
R. Wilson
T. Yamada
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Shoji
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
M. Funabashi
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Utaka
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Arai
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
R. Wilson
Affiliation:
Rigaku/USA, Inc. Danvers, MA
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Extract

Total reflection X-ray fluorescence (TXRF) analysis of “low Z” elements, Ti, Fe, Ni, Cu, Zn and “high Z” elements, Zr, W, Au, Pb, are required for micro scale semiconductor device production processes. In the past, the W–Lβ X-rays have been used for the analysis of S to Zn.

This paper describes a new three crystal monochromator coupled with a gold direct-drive rotating anode target. This development has produced significant improvements in the sensitivities and LLD's for all measured elements. The monochromator makes the Au Lα (9.71 keV), Au Lβ (11.44 keV) and Au Lγ (13.33 keV) available for routine use in TXRF analyses. The Au Lα X-ray is best used for the lower Z elements, Na to Cu. The best result for W, Cu and Zn are obtained with the Au Lβ X-ray. This is the result of both increased peak intensity and lower background. For the heavier elements, such as Au and Pb, the Au L X-ray yields intensities 100 times higher than what has been achieved in the past.

Type
IV. New Developments in X-Ray Sources, Instrumentation and Techniques
Information
Advances in X-Ray Analysis , Volume 38: Forty-third Annual Conference on Applications of X-ray Analysis , 1994 , pp. 313 - 317
Copyright
Copyright © International Centre for Diffraction Data 1994

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References

1. Utaka, T., Sako, Y., Kojima, S., Iwamoto, K, Kouno, H., and Atsumi, J., “Ultra-trace Analysis by Total Reflection X-Ray Fluorescence Method”, Advances in X-Ray Chemical Analysis Japan, vol. 23, p. 225, 1992.Google Scholar
2. Utaka, T. et al., “Instrumentation and Applications of Total Reflection Fluorescent X-Ray Spectrometry”, Rigaku Journal, vol. 9, No. 1, p. 29, 1992.Google Scholar
3. Utaka, T., Shoji, T., Shimizu, K., Arai, T., and Wilson, R., “TXRF High Sensitivity X-Ray Analyzer with Multi-layer Monochromator”, Advances In X-Ray Analysis, vol-37, p. 599, 1994,Google Scholar