Hostname: page-component-8448b6f56d-c47g7 Total loading time: 0 Render date: 2024-04-25T03:49:42.488Z Has data issue: false hasContentIssue false

Determination of Thickness and Composition of Thin AlxGa1-xAs Films on GaAs substrates by Total Electron Yield (Tey) Measurements

Published online by Cambridge University Press:  06 March 2019

Horst Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Robert Svagera
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Maria F. Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Norbert Zagler
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Get access

Extract

In our paper “Determination of thickness and composition of thin AlxGa1-xAs layers on GaAs by total electron yield (TEY)” we described the principles of the determination of thickness t and Al concentration x employing TEY. The essential experimental quantities are the absorption edge jumps of the-eleraents measured in TEY-mode:

Since the problem asks for the quantification of two unknowns (x,t), at least two TEYjumps are needed. The K jumps of Al and Ga deliver reliable information. From the theoretical approach1,2 of quantitative TEY a nearly linear relationship between the measured TEY jumps and the composition (in wt%) has to be expected. The As concentration varies over the interesting composition range 0<x<0.6 from approximately 50 to 60wt% and causes a similar variation of the TEY jump versus x. In combination with the statistical significance of the experimental data we neglect the TEY K jump information from As.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Ebel, M. F., Svagera, R., Ebel, H., Hobl, R., Mantler, M., Wernisch, J., and Zagler, N., Adv. X-Ray Anal. 38 (1995) (in press)Google Scholar
2 Ebel, H., Svagera, R., and Zagler, N., Adv. X-Ray Anal 38 (1995) (in press)Google Scholar
3 Ebel, H., Svagera, R., Ebel, M. F., Zagler, N., Werner, W. S. M., Stori, H., and Gröschl, M. Adv. X-Ray Anal. (this volume)Google Scholar