Hostname: page-component-848d4c4894-p2v8j Total loading time: 0.001 Render date: 2024-05-18T10:56:28.537Z Has data issue: false hasContentIssue false
  • English
  • Français

High Resolution Digital X-Ray Rocking Curve Topography

Published online by Cambridge University Press:  06 March 2019

T.S. Ananthanarayanan ,
W.E. Mayo  and
R.G. Rosemeier
T.S. Ananthanarayanan
Affiliation:
Brimrose Corp. of America, 7720 Belair Road, Baltimore, MD
W.E. Mayo
Affiliation:
Rutgers University, Piscataway, NJ
R.G. Rosemeier
Affiliation:
Brimrose Corp. of America, 7720 Belair Road, Baltimore, MD
Get access

Abstract

This study presents a unique and novel enhancement of the double crystal diffractometer which allows topographic mapping of X-ray diffraction rocking curve half widths at about 100-150μm spatial resolution. This technique can be very effectively utilized to map micro-lattice strain fields in crystalline materials. The current focus will be on the application of a recently developed digital implementation for the rapid characterization of defect structure and distribution in various semiconductor materials.

Digital Automated Rocking Curve (DARC) topography has been successfully applied for characterizing defect structure in materials such as: GaAs, Si, AlGaAs, HgMnTe, HgCdTe, CdTe, Al, Inconnel, Steels, BaF2 PbS, PbSe, etc. The non-intrusive (non- contact & non-destructive) nature of the DARC technique allows its use in studing several phenomena such as corrosion fatigue, recrystallization, grain growth, etc., in situ. DARC topography has been used for isolating regions of non-uniform dislocation density on various materials. It is envisioned that this highly sophisticated, yet simple to operate, system will improve semiconductor-device yield significantly.

The high strain sensitivity of the technique results from combination of the highly monochromated and collimated X-ray probe beani, the State of the art linear position-sensitive detector (LPSD) and the high-precision specimen goniometer.

Type
X. X-Ray Stress Analysis, Fractography
Information
Advances in X-Ray Analysis , Volume 30: Thirty-Fifth Annual Conference on Applications of X-ray Analysis, August 4-8, 1986 , 1986 , pp. 527 - 535
Copyright
Copyright © International Centre for Diffraction Data 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Guinier, A., “X-ray Diffraction”, W. H. Freeman & Co., 1963 ed., San Francisco.Google Scholar
2. Reifsnider, K., and Green, R.E. Jr., “An I age Intensifier System for Dynamic X-ray Diffraction Studies”, Rev. Sci. Iastr. 39, 1651, (1968).Google Scholar
3. Weissmann, S., “Recent Advances in X-ray Diffraction Topography”, Fifty Years of Progress in Metallographic Techniques, “ Special Technical Publication No. 430.Google Scholar
4. Reis, A., Slade, J.J. and Weissmann, S., Appl. Phys. Vol. 22, p. 655 (1951) Slade, J.J. Jr., and S. Weissmann, Appl. Phys. Vol. 23, p. 323 (1952)Google Scholar
5. Pangborn, R., Ph. D. Thesis, Rutgers University, 1982 Google Scholar
6. Rosemeier, R.G., Ananthanarayanan, T.S. and Mayo, W., “Feasibility Study on Real Time X-ray Topography - Phase I. inal Report”, DARPA. September 1984 - February 1985.Google Scholar
7. Mayo, W., Yazici, R., Takemoto, T. and Weissmann, S., XII. ongress of Int. Union of Crystallography, 1981, Ottawa, Canada.Google Scholar
8. Mayo, W., PH. D. Thesis, Rutgers University, 1982.Google Scholar
9. Yazici, R., Ph. D. Thesis, Rutgers University, 1982.Google Scholar
10. Liu, H.Y., Ph. D. Thesis, Rutgers University, 1982.Google Scholar
11. Liu, H.Y., Mayo, W.E. and Weissmann, S., Mat. Sci. and Eng., 63 (1984) 81.Google Scholar