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Peak Broadening in Asymmetric X-Ray Diffraction Resulting from Chi Tilts

Published online by Cambridge University Press:  06 March 2019

Danut Dragoi ,
T. R. Watkins  and
K. J. Kozaczek
Danut Dragoi
Affiliation:
University of Denver, Denver CO, U.S.A.
T. R. Watkins
Affiliation:
High Temperature Materials Laboratory, Oak Ridge National Laboratory, 1 Bethel Valley Road, P.O. Box 2008, Oak Ridge, Tennessee 37831-6064, U.S.A.
K. J. Kozaczek
Affiliation:
High Temperature Materials Laboratory, Oak Ridge National Laboratory, 1 Bethel Valley Road, P.O. Box 2008, Oak Ridge, Tennessee 37831-6064, U.S.A.
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Abstract

The objective of this study was to measure the peak broadening inherent in chi (x) tilting and compare that to a geometrical model. The (012) and (300) reflections from a Al2O3 plate (NIST SRM 1976) were each scanned every 100 from -700 to +700x (15 lilts/reflection) to examine the influence of a low and high 2θ, respectively. The absorption correction was not taken into account. The equation y=2m1| tan x | cosθ+m2 fits well the data from both low and high 2θ except the point x =0. The extended equation y=m1cosh(m2tan x cosθ) fits well with all the experimental points.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 499 - 503
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

Cullity, B. D., (1978), “Elements of X-Ray Diffraction”, Addison-Wesley Publishing Company, Inc. Dragoi, D., (1993), Adv, X-Ray Analysis, Vol. 36, 605.Google Scholar