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X-Ray Fluorescence Analysis of Multi-Layer Thin Films

Published online by Cambridge University Press:  06 March 2019

T. C. Huang  and
W. Parrish
T. C. Huang
Affiliation:
IBM Almaden Research Center, K31/80 650 Harry Road San Jose, CA 95120-6099
W. Parrish
Affiliation:
IBM Almaden Research Center, K31/80 650 Harry Road San Jose, CA 95120-6099
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Abstract

The characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 29: Thirty-Fourth Annual Conference on Applications of X-ray Analysis, August 5-9, 1985 , 1985 , pp. 395 - 402
Copyright
Copyright © International Centre for Diffraction Data 1985

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References

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